Single domain wall magnetoresistance electron-beam fabrication and magnetoresistance measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8100, Issue , 2011, Pages

  Wang, Yudong ^a   De Groot, C H ^a   Claudio Gonzalez, D ^b   Charlton, M D B ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b UNIVERSITY OF GUANAJUATO   (Mexico)

Author keywords

Constrained domain wall width; Domain wall magnetoresistance; DWMR; E beam lithography

Indexed keywords

ALIGNMENT TOLERANCE; BI-LAYER; CONSTRAINED DOMAIN; DOMAIN WALL MAGNETORESISTANCE; DOMAIN WALL MAGNETORESISTANCES; DOMAIN WALL WIDTH; DWMR; E-BEAM LITHOGRAPHY; EXPOSURE DOSE; H-SHAPED; LIFT-OFF PROCESS; LONG AXIS; MAGNETORESISTANCE MEASUREMENTS; PROXIMITY EFFECT CORRECTION; ROOM TEMPERATURE; SENSING TECHNIQUES; SINGLE DOMAIN WALL; TOP-DOWN FABRICATION; ZERO FIELDS;

ELECTRIC RESISTANCE; MAGNETIC FIELDS; MAGNETOELECTRONICS; MAGNETORESISTANCE; NANOTECHNOLOGY; SENSORS;

MAGNETIC DOMAINS;

EID: 80053490908     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.892299     Document Type: Conference Paper

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