Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a "best Dose Sensor

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2158-2162

  Unal, Nezih ^a   Charlton, Martin D B ^b   Wang, Yudong ^b   Waizmann, Ulrike ^c   Reindl, Thomas ^c   Hofmann, Ulrich ^a  

^a GenISys GmbH   (Germany)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^c MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

Electron beam lithography; PEC parameter; Point spread function; Proximity effect

Indexed keywords

CRITICAL DIMENSION MEASUREMENT; DIRECT MEASUREMENT; E-BEAM PROXIMITY EFFECT; EVALUATION CRITERIA; EXPERIMENTAL CALIBRATION; EXPERIMENTAL EVALUATION; EXPERIMENTAL METHODS; LABOR INTENSIVE; MONTE CARLO SIMULATION; PARAMETER CALIBRATION; PEC PARAMETER; POINT-SPREAD FUNCTION; PROXIMITY EFFECT CORRECTION; PROXIMITY EFFECTS; RESIST BLUR; SCATTERING CO-EFFICIENT; VISUAL INSPECTION;

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; MONTE CARLO METHODS; OPTICAL TRANSFER FUNCTION; SENSORS;

CALIBRATION;

EID: 79960067335     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.066     Document Type: Conference Paper

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