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Volumn 322, Issue 9-12, 2010, Pages 1467-1470

Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel

Author keywords

20 nm constrictions; Constrained geometries; Domain wall; DWMR; E beam lithography; EBL; Magnetoresistance

Indexed keywords

20-NM CONSTRICTIONS; ANISOTROPIC MAGNETORESISTANCE; BI-LAYER; CONSTRAINED GEOMETRY; DOMAIN WALL MAGNETORESISTANCES; DOMAIN-WALL SCATTERING; E-BEAM LITHOGRAPHY; FABRICATION PROCESS; LIFT-OFF PROCESS; MAGNETO-RESISTIVE EFFECT; MICROMAGNETIC SIMULATIONS; NANOBRIDGE; REDUCED LENGTH; REPRODUCIBILITIES; SYSTEMATIC ANALYSIS;

EID: 77949280954     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2009.02.142     Document Type: Article
Times cited : (13)

References (18)
  • 14
    • 34249100243 scopus 로고    scopus 로고
    • A systematic approach to multiphysics extensions of finite-element- based micromagnetic simulations: nmag
    • 〈http://nmag.soton.ac.uk〉
    • Fischbacher T., Franchin M., Bordignon G., and Fangohr H. A systematic approach to multiphysics extensions of finite-element- based micromagnetic simulations: nmag. IEEE Trans. Magn. 43 6 (2007) 2896-2898. http://nmag.soton.ac.uk 〈http://nmag.soton.ac.uk〉
    • (2007) IEEE Trans. Magn. , vol.43 , Issue.6 , pp. 2896-2898
    • Fischbacher, T.1    Franchin, M.2    Bordignon, G.3    Fangohr, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.