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Volumn 322, Issue 9-12, 2010, Pages 1467-1470
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Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel
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Author keywords
20 nm constrictions; Constrained geometries; Domain wall; DWMR; E beam lithography; EBL; Magnetoresistance
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Indexed keywords
20-NM CONSTRICTIONS;
ANISOTROPIC MAGNETORESISTANCE;
BI-LAYER;
CONSTRAINED GEOMETRY;
DOMAIN WALL MAGNETORESISTANCES;
DOMAIN-WALL SCATTERING;
E-BEAM LITHOGRAPHY;
FABRICATION PROCESS;
LIFT-OFF PROCESS;
MAGNETO-RESISTIVE EFFECT;
MICROMAGNETIC SIMULATIONS;
NANOBRIDGE;
REDUCED LENGTH;
REPRODUCIBILITIES;
SYSTEMATIC ANALYSIS;
COMPUTATIONAL GEOMETRY;
ELECTRIC RESISTANCE;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
FABRICATION;
MAGNETIC DOMAINS;
MAGNETIC FIELD EFFECTS;
MAGNETOELECTRONICS;
MAGNETORESISTANCE;
NANOSTRUCTURES;
DOMAIN WALLS;
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EID: 77949280954
PISSN: 03048853
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jmmm.2009.02.142 Document Type: Article |
Times cited : (13)
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References (18)
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