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Volumn , Issue , 2011, Pages

Independent double-gate FinFET SRAM technology

Author keywords

Double gate; FinFET; SRAM

Indexed keywords

DOUBLE-GATE; FINFET; FUNCTION VARIATION; METAL-GATE; NOISE MARGINS; SRAM CELL;

EID: 80053021430     PISSN: 21593523     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/INEC.2011.5991796     Document Type: Conference Paper
Times cited : (4)

References (9)
  • 1
    • 6344290643 scopus 로고
    • Calculated threshold-voltage characteristics of an XMOS transistor having an additional bottom gate
    • T. Sekigawa and Y. Hayashi, "Calculated threshold-voltage characteristics of an XMOS transistor having an additional bottom gate", Solid State Electron., vol. 27, pp. 827-828, 1984.
    • (1984) Solid State Electron. , vol.27 , pp. 827-828
    • Sekigawa, T.1    Hayashi, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.