Self-assembled monolayer formation on copper: A real time electrochemical impedance study

Journal of Physical Chemistry C

Volumn 115, Issue 37, 2011, Pages 18202-18207

  Dilimon, V S ^a   Fonder, G ^a   Delhalle, J ^a   Mekhalif, Z ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION PROCESS; COPPER OXIDE LAYERS; COPPER SUBSTRATES; ELECTROCHEMICAL IMPEDANCE; ELECTROCHEMICAL STUDIES; EX SITU; FUNCTION OF TIME; IN-SITU; INFRARED REFLECTION ABSORPTION; INTERFACIAL CAPACITANCE; MONOLAYER FORMATION; N-DODECANESELENOL; N-DODECANETHIOL; OXIDE REMOVAL; PM-IRRAS; POLARIZATION MODULATION; REAL TIME; SAM FORMATION; SELF-ASSEMBLING;

ADSORPTION; COPPER; ELECTROCHEMICAL CORROSION; PRECIOUS METALS; SELENIUM COMPOUNDS; SELF ASSEMBLED MONOLAYERS;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 80052808939     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp203652y     Document Type: Article

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