Functionally decoupled soft lithography for patterning polymer brushes

Small

Volumn 7, Issue 18, 2011, Pages 2669-2674

  Moran, Isaac W ^a   Ell, John R ^a   Carter, Kenneth R ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Imprint lithography; living polymerization; patterned brushes; polymer grafting; soft lithography

Indexed keywords

ACTIVE LAYER; CRITICAL DIMENSION; ELECTRON TRANSFER; GRATING PATTERNS; IMPRINT LITHOGRAPHY; LINE GRATING; NANO-SCALE PATTERNS; PATTERNED BRUSHES; POLYMER BRUSHES; POLYMER CHAINS; POLYMER GRAFTING; SILICON SUBSTRATES; SOFT LITHOGRAPHY; SOFT-IMPRINT; SURFACE INITIATED POLYMERIZATION; SURFACE-INITIATED ATOM TRANSFER;

ANGLE MEASUREMENT; ATOM TRANSFER RADICAL POLYMERIZATION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BRUSHES; CONTACT ANGLE; FREE RADICAL REACTIONS; GRAFTING (CHEMICAL); INFRARED SPECTROSCOPY; LIVING POLYMERIZATION; MONOLAYERS; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLYSTYRENES; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SURFACE CHEMISTRY;

FUNCTIONAL POLYMERS;

POLY(METHYL METHACRYLATE); POLYMACON; POLYMER; POLYSTYRENE DERIVATIVE; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; SURFACE PROPERTY;

MICROSCOPY, ATOMIC FORCE; POLYHYDROXYETHYL METHACRYLATE; POLYMERS; POLYMETHYL METHACRYLATE; POLYSTYRENES; SILICON; SURFACE PROPERTIES;

EID: 80052710272     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201100895     Document Type: Article

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