Metal-assisted chemical etching using sputtered gold: A simple route to black silicon

Science and Technology of Advanced Materials

Volumn 12, Issue 4, 2011, Pages

  Kurek, Agnieszka ^a   Barry, Sen T ^a  

^a CARLETON UNIVERSITY   (Canada)

Author keywords

etching; gold; nanostructure; Silicon; sputtering

Indexed keywords

AQUA REGIA; BLACK SILICON; COLUMNAR STRUCTURES; LABORATORY EQUIPMENTS; METAL-ASSISTED CHEMICAL ETCHING; SILICON SUBSTRATES; SIMPLE METHOD; SURFACE FEATURE; ULTRA-SONICATION;

ASPECT RATIO; CHEMICAL EQUIPMENT; ETCHING; HYDROFLUORIC ACID;

GOLD;

EID: 80052597627     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/12/4/045001     Document Type: Article

References (13)

1. Lehmann V and Gosele U 1991 Appl. Phys. Lett. 58 856
2. Lehmann V and Foll H 1990 J. Electrochem. Soc. 137 653
3. Barla K, Bomchil G, Herino R, Pfister J C and Baruchel J 1984 J. Cryst. Growth 68 721
4. For an excellent review, see: Korotcenkov G and Cho B K 2010 Crit. Rev. Solid State Mater. Sci. 35 153
5. Li X and Bohn P W 2000 Appl. Phys. Lett. 77 2572
6. Lee C L, Tsujino K, Kanda Y, Ikeda S and Matsumura M 2007 J. Mater. Chem. 18 1015
7. Striemer C C and Fauchet F 2003 Phys. Status Solidi a 197 502
8. Barberoglou M, Zorba V, Pagozidis A, Fotakis C and Stratakis E 2010 Langmuir 26 13007
9. Choi W K, Liew T H and Dawood M K 2008 Nano Lett. 8 11
10. Chartier C, Bastide S and Levy-Clement C 2008 Electrochim. Acta 53 5509
11. Asoh H, Arai F and Ono S 2009 Electrochim. Acta 54 5142
12. Aldinger B S, Gupta A, Clark I T and Hines M A 2010 J. Appl. Phys. 107 103520
13. Tsujino K and Matsumura M 2007 Electrochim. Acta 53 28