Lithium diffusion in (Li, K, Na)NbO3 piezoeletric thin films and the resulting approach for enhanced performance properties

Applied Physics Letters

Volumn 99, Issue 9, 2011, Pages

  Chin Goh, Phoi ^a   Yao, Kui ^a   Chen, Zhong ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ENHANCED PERFORMANCE; LITHIUM COMPOSITION; LITHIUM DIFFUSION; OUT-DIFFUSION; PIEZOELECTRIC STRAIN COEFFICIENTS; VOLTAGE COEFFICIENT;

DIFFUSION; ELECTRIC PROPERTIES; NIOBIUM OXIDE; POTASSIUM; SODIUM; THIN FILMS;

LITHIUM;

EID: 80052545223     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3631761     Document Type: Article

References (25)

1. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, and M. Nakamaru, Nature 432, 84 (2004). 10.1038/nature03028 (Pubitemid 39496798)
2. Y. Guo, K. Kakimoto, and H. Ohsato, Mater. Lett. 59, 241 (2005). 10.1016/j.matlet.2004.07.057
3. E. Hollenstein, M. Davis, D. Damjanovic, and N. Setter, Appl. Phys. Lett. 87, 182905 (2005). 10.1063/1.2123387 (Pubitemid 41528215)
4. P. Zhao, B. P. Zhang, and J. F. Li, Appl. Phys. Lett. 90, 242909 (2007). 10.1063/1.2748088 (Pubitemid 46934803)
5. D. Lin, K. W. Kwok, K. H. Lam, and H. L. W. Chan, J. Appl. Phys. 101, 074111 (2007). 10.1063/1.2715486 (Pubitemid 46610133)
6. D. Liu, H. Du, F. Tang, F. Luo, D. Zhu, and W. Zhou, J. Electroceram. 20, 107 (2008). 10.1007/s10832-007-9373-2
7. Y. Guo, K. Kakimoto, and H. Ohsato, Appl. Phys. Lett. 85, 4121 (2004). 10.1063/1.1813636
8. H. Du, F. Tang, D. Liu, D. Zhu, W. Zhou, and S. Qu, Mater. Sci. Eng., B 136, 165 (2007). 10.1016/j.mseb.2006.09.031 (Pubitemid 46038065)
9. B. Malic, J. Bernard, J. Holc, D. Jenko, and M. Kosec, J. Eur. Ceram. Soc. 25, 2707 (2005). 10.1016/j.jeurceramsoc.2005.03.127 (Pubitemid 40829703)
10. R. Zuo, J. Rdel, R. Chen, and L. Li, J. Am. Ceram. Soc. 89, 2010 (2006). 10.1111/j.1551-2916.2006.00991.x (Pubitemid 43824109)
11. J. F. Li, K. Wang, B. P. Zhang, and L. M. Zhang, J. Am. Ceram. Soc. 89, 706 (2006). 10.1111/j.1551-2916.2005.00743.x
12. F. Lai, J. F. Li, Z. X. Zhu, and Y. Xu, J. Appl. Phys. 106, 064101 (2009). 10.1063/1.3223320
13. C. W. Ahn, E. D. Jeong, S. Y. Lee, H. J. Lee, S. H. Kang, and I. W. Kim, Appl. Phys. Lett. 93, 212905 (2008). 10.1063/1.3037214
14. J. S. Kim, S. Y. Lee, C. W. Ahn, H. I. Hwang, H. J. Lee, S. H. Bae, and I. W. Kim, Jpn. J. Appl. Phys. 49, 095805 (2010). 10.1143/JJAP.49.095805
15. M. Abazari, E. K. Akdoen, and A. Safari, J. Appl. Phys. 103, 104106 (2008). 10.1063/1.2927470 (Pubitemid 351776519)
16. P. C. Goh, K. Yao, and Z. Chen, Appl. Phys. Lett. 97, 102901 (2010). 10.1063/1.3488808
17. D. P. I. Birnie and P. F. Bordui, J. Appl. Phys. 76, 3422 (1994). 10.1063/1.357472
18. E. Antolini, J. Mater. Chem. 8, 2783 (1998). 10.1039/a805948i
19. P. C. Goh, K. Yao, and Z. Chen, J. Am. Ceram. Soc. 92, 1322 (2009). 10.1111/j.1551-2916.2009.03058.x
20. Y. Saito and H. Takao, Ferroelectrics 338, 17 (2006). 10.1080/00150190600732512 (Pubitemid 44180056)
21. Y. Nakashima, W. Sakamoto, H. Maiwa, T. Shimura, and T. Yogo, Jpn. J. Appl. Phys. 46, L311 (2007). 10.1143/JJAP.46.L311 (Pubitemid 47252403)
22. L. Y. Wang, K. Yao, and W. Ren, Appl. Phys. Lett. 93, 092903 (2008). 10.1063/1.2978160
23. C. W. Ahn, S. Y. Lee, H. J. Lee, A. Ullah, J. S. Bae, E. D. Jeong, J. S. Choi, B. H. Park, and I. W. Kim, J. Phys. D 42, 215304 (2009). 10.1088/0022-3727/42/21/215304
24. L. Lian and N. R. Sottos, J. Appl. Phys. 87, 3941 (2000). 10.1063/1.372439
25. K. Yao and F. E. H. Tay, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 50, 113 (2003). 10.1109/TUFFC.2003.1182115