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Volumn 21, Issue 36, 2011, Pages 13902-13908

Low loss photopatternable matrix materials for LWIR-metamaterial applications

(11) Rasberry, Roger D a Lee, Yun Ju a Ginn, James C a Hines, Paul F a Arrington, Christian L a Sanchez, Andrea E a Brumbach, Michael T a Clem, Paul G a Peters, David W a Sinclair, Michael B a Dirk, Shawn M a

a SANDIA NATIONAL LABORATORIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMMERCIAL PHOTORESIST; HIGH-K DIELECTRIC; INTEGRATED OPTICAL DEVICES; LONG-WAVELENGTH INFRARED; LOW LOSS; MATRIX MATERIALS; METAMATERIAL STRUCTURES; NEGATIVE PHOTORESISTS; PLANARIZING; POLYMER DIELECTRICS; POLYNORBORNENES; SPECTRAL RANGE; SPECTRAL REGION; STRUCTURAL MATRIX; THICK LAYERS; THIOL-ENE COUPLING; THREE-DIMENSIONAL (3D); TRANSPARENT MATRIX; VIBRATIONAL ABSORPTION; VISIBLE AND NEAR INFRARED;

ABSORPTION; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; GLASS TRANSITION; LENSES; METAMATERIALS; OLEFINS; PHOTORESISTS; POLYMERS; THREE DIMENSIONAL;

INFRARED RADIATION;

EID: 80052330889 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c1jm12761f Document Type: Article

Times cited : (8)

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