Laser ablation of silicon dioxide on silicon using femtosecond near infrared laser pulses

Energy Procedia

Volumn 8, Issue , 2011, Pages 467-472

  Rublack, Tino ^a   Muchow, Markus ^a   Hartnauer, Stefan ^a   Seifert, Gerhard ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

Silicon; Threshold; Ultra short laser ablation

Indexed keywords

ABLATION; INFRARED DEVICES; INFRARED LASERS; LASER PULSES; SILICON; SILICON OXIDES; SILICON WAFERS; ULTRASHORT PULSES;

ABLATION MECHANISMS; LASER PULSE DURATION; MULTI-PULSE IRRADIATION; NEAR-INFRARED LASERS; SELECTIVE ABLATIONS; THRESHOLD; THRESHOLD FLUENCES; ULTRA-SHORT LASER ABLATION;

LASER ABLATION;

EID: 80052100056     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.06.167     Document Type: Conference Paper

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