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Volumn 8, Issue , 2011, Pages 349-354

Electrical properties of boron, phosphorus and gallium co-doped silicon

Author keywords

Carriers mobility; Doping compensation; Silicon

Indexed keywords

CARRIER MOBILITY; DOPING (ADDITIVES); GALLIUM; INGOTS; METAL CASTINGS; PHOSPHORUS;

EID: 80052086173     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.06.148     Document Type: Conference Paper
Times cited : (27)

References (14)
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  • 3
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    • Jun.
    • J. Veirman, S. Dubois, N. Enjalbert, J.-P. Garandet, D.R. Heslinga, and M. Lemiti, "Hall mobility reduction in singlecrystalline silicon gradually compensated by thermal donors activation, " Solid-State Electronics, vol. 54, Jun. 2010, pp. 671- 674.
    • (2010) Solid-State Electronics , vol.54 , pp. 671-674
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  • 5
    • 77951582416 scopus 로고    scopus 로고
    • Doping engineering as a method to increase the performance of purified MG Silicon during ingot crystallisation
    • J. Kraiem, R. Einhaus, and H. Lauvray, "Doping engineering as a method to increase the performance of purified MG Silicon during ingot crystallisation, " 2009 34th IEEE Photovoltaic Specialists Conference (PVSC), IEEE, 2009, pp. 001327-001330.
    • (2009) 2009 34th IEEE Photovoltaic Specialists Conference (PVSC), IEEE , pp. 001327-001330
    • Kraiem, J.1    Einhaus, R.2    Lauvray, H.3
  • 6
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    • M. Forster, E. Fourmond, R. Einhaus, H. Lauvray, J. Kraiem, and M. Lemiti, " Ga co-doping in Cz-grown silicon ingots to overcome limitations of B and P compensated silicon feedstock for PV applications, " physica status solidi (c), vol. 8, Jan. 2011, 678-681.
    • (2011) Physica Status Solidi (C) , vol.8 , pp. 678-681
    • Forster, M.1    Fourmond, E.2    Einhaus, R.3    Lauvray, H.4    Kraiem, J.5    Lemiti, M.6
  • 9
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    • Theoretical analysis of hall factor and hall mobility in p-type silicon
    • J. Lin, S. Li, L. Linares, and K. Teng, "Theoretical analysis of hall factor and hall mobility in p-type silicon, " Solid-State Electronics, vol. 24, Sep. 1981, pp. 827-833. (Pubitemid 12462241)
    • (1981) Solid-State Electronics , vol.24 , Issue.9 , pp. 827-833
    • Lin, J.F.1    Li, S.S.2    Linares, L.C.3    Teng, K.W.4
  • 10
    • 0005593223 scopus 로고
    • Calculation of the mobility and the Hall factor for doped p-type silicon
    • F. Szmulovicz, "Calculation of the mobility and the Hall factor for doped p-type silicon" Phys. Rev. B. 34, 4031 (1986).
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    • Szmulovicz, F.1
  • 12
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    • Accurate determination of minority carrier- and lattice scattering-mobility in silicon from photoconductance decay
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    • (1992) Journal of Applied Physics , vol.72 , pp. 4161
    • Sproul, A.B.1    Green, M.A.2    Stephens, A.W.3
  • 14
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    • Electron and hole mobilities in silicon as a function of concentration and temperature
    • Feb.
    • N.D. Arora, J.R. Hauser, and D.J. Roulston, "Electron and hole mobilities in silicon as a function of concentration and temperature, " IEEE Transactions on Electron Devices, vol. 29, Feb. 1982, pp. 292-295.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.