-
1
-
-
67349225537
-
PHOTOSIL - simplified production of solar silicon from metallurgical silicon
-
Dresden
-
R. Einhaus, J. Kraiem, F. Cocco, Y. Caratini, D. Bernou, D. Sarti, G. Rey, R. Monna, C. Trassy, J. Degoulange, Y. Delannoy, S. Martinuzzi, I. Périchaud, M.C. Record, and P. Rivat, "PHOTOSIL - Simplified Production of Solar Silicon from Metallurgical Silicon, " Proc. of the 21st European PVSEC, Dresden: 2006, pp. 6-9.
-
(2006)
Proc. of the 21st European PVSEC
, pp. 6-9
-
-
Einhaus, R.1
Kraiem, J.2
Cocco, F.3
Caratini, Y.4
Bernou, D.5
Sarti, D.6
Rey, G.7
Monna, R.8
Trassy, C.9
Degoulange, J.10
Delannoy, Y.11
Martinuzzi, S.12
Périchaud, I.13
Record, M.C.14
Rivat, P.15
-
2
-
-
48249151470
-
Effects of the compensation level on the carrier lifetime of crystalline silicon
-
S. Dubois, N. Enjalbert, and J.-P. Garandet, "Effects of the compensation level on the carrier lifetime of crystalline silicon, " Applied Physics Letters, vol. 93, 2008, p. 32114.
-
(2008)
Applied Physics Letters
, vol.93
, pp. 32114
-
-
Dubois, S.1
Enjalbert, N.2
Garandet, J.-P.3
-
3
-
-
77950300412
-
Hall mobility reduction in singlecrystalline silicon gradually compensated by thermal donors activation
-
Jun.
-
J. Veirman, S. Dubois, N. Enjalbert, J.-P. Garandet, D.R. Heslinga, and M. Lemiti, "Hall mobility reduction in singlecrystalline silicon gradually compensated by thermal donors activation, " Solid-State Electronics, vol. 54, Jun. 2010, pp. 671- 674.
-
(2010)
Solid-State Electronics
, vol.54
, pp. 671-674
-
-
Veirman, J.1
Dubois, S.2
Enjalbert, N.3
Garandet, J.-P.4
Heslinga, D.R.5
Lemiti, M.6
-
4
-
-
77955223091
-
Electron and hole mobility reduction and Hall factor in phosphorus-compensated p-type silicon
-
F.E. Rougieux, D. Macdonald, A. Cuevas, S. Ruffell, J. Schmidt, B. Lim, and A.P. Knights, "Electron and hole mobility reduction and Hall factor in phosphorus-compensated p-type silicon, " Journal of Applied Physics, vol. 108, 2010, p. 013706.
-
(2010)
Journal of Applied Physics
, vol.108
, pp. 013706
-
-
Rougieux, F.E.1
Macdonald, D.2
Cuevas, A.3
Ruffell, S.4
Schmidt, J.5
Lim, B.6
Knights, A.P.7
-
5
-
-
77951582416
-
Doping engineering as a method to increase the performance of purified MG Silicon during ingot crystallisation
-
J. Kraiem, R. Einhaus, and H. Lauvray, "Doping engineering as a method to increase the performance of purified MG Silicon during ingot crystallisation, " 2009 34th IEEE Photovoltaic Specialists Conference (PVSC), IEEE, 2009, pp. 001327-001330.
-
(2009)
2009 34th IEEE Photovoltaic Specialists Conference (PVSC), IEEE
, pp. 001327-001330
-
-
Kraiem, J.1
Einhaus, R.2
Lauvray, H.3
-
6
-
-
79952689597
-
Ga co-doping in Cz-grown silicon ingots to overcome limitations of B and P compensated silicon feedstock for PV applications
-
Jan.
-
M. Forster, E. Fourmond, R. Einhaus, H. Lauvray, J. Kraiem, and M. Lemiti, " Ga co-doping in Cz-grown silicon ingots to overcome limitations of B and P compensated silicon feedstock for PV applications, " physica status solidi (c), vol. 8, Jan. 2011, 678-681.
-
(2011)
Physica Status Solidi (C)
, vol.8
, pp. 678-681
-
-
Forster, M.1
Fourmond, E.2
Einhaus, R.3
Lauvray, H.4
Kraiem, J.5
Lemiti, M.6
-
7
-
-
80052078624
-
Innovative crystallisation process and furnace for solar grade silicon
-
F. Lissalde, R. Einhaus, J. Kraiem, and B. Debunne, "Innovative crystallisation process and furnace for solar grade silicon, " 22nd European Photovoltaic Solar Energy Conference, 2007, pp. 948-951.
-
(2007)
22nd European Photovoltaic Solar Energy Conference
, pp. 948-951
-
-
Lissalde, F.1
Einhaus, R.2
Kraiem, J.3
Debunne, B.4
-
9
-
-
0019608054
-
Theoretical analysis of hall factor and hall mobility in p-type silicon
-
J. Lin, S. Li, L. Linares, and K. Teng, "Theoretical analysis of hall factor and hall mobility in p-type silicon, " Solid-State Electronics, vol. 24, Sep. 1981, pp. 827-833. (Pubitemid 12462241)
-
(1981)
Solid-State Electronics
, vol.24
, Issue.9
, pp. 827-833
-
-
Lin, J.F.1
Li, S.S.2
Linares, L.C.3
Teng, K.W.4
-
10
-
-
0005593223
-
Calculation of the mobility and the Hall factor for doped p-type silicon
-
F. Szmulovicz, "Calculation of the mobility and the Hall factor for doped p-type silicon" Phys. Rev. B. 34, 4031 (1986).
-
(1986)
Phys. Rev. B.
, vol.34
, pp. 4031
-
-
Szmulovicz, F.1
-
11
-
-
79952996966
-
Doping concentration and mobility in compensated material: Comparison of different determination methods
-
J. Geilker, W. Kwapil, I. Reis, and S. Rein, "Doping concentration and mobility in compensated material: comparison of different determination methods, " Proceedings of the 25st Europ. Photovoltaic Solar Energy Conference, vol. 2, 2010, p. 6.
-
(2010)
Proceedings of the 25st Europ. Photovoltaic Solar Energy Conference
, vol.2
, pp. 6
-
-
Geilker, J.1
Kwapil, W.2
Reis, I.3
Rein, S.4
-
12
-
-
0000265019
-
Accurate determination of minority carrier- and lattice scattering-mobility in silicon from photoconductance decay
-
A.B. Sproul, M.A. Green, and A.W. Stephens, "Accurate determination of minority carrier- and lattice scattering-mobility in silicon from photoconductance decay, " Journal of Applied Physics, vol. 72, 1992, p. 4161.
-
(1992)
Journal of Applied Physics
, vol.72
, pp. 4161
-
-
Sproul, A.B.1
Green, M.A.2
Stephens, A.W.3
-
13
-
-
82355188883
-
Iso-carrier density comparison of compensation effects on highly doped solar- grade silicon solar cells
-
Valencia, Spain
-
J. Veirman, S. Dubois, N. Enjalbert, J.-P. Garandet, and M. Lemiti, "Iso-carrier density comparison of compensation effects on highly doped solar- grade silicon solar cells, " Proceedings of the 25st Europ. Photovoltaic Solar Energy Conference, Valencia, Spain: 2010, pp. 1-5.
-
(2010)
Proceedings of the 25st Europ. Photovoltaic Solar Energy Conference
, pp. 1-5
-
-
Veirman, J.1
Dubois, S.2
Enjalbert, N.3
Garandet, J.-P.4
Lemiti, M.5
-
14
-
-
0020087475
-
Electron and hole mobilities in silicon as a function of concentration and temperature
-
Feb.
-
N.D. Arora, J.R. Hauser, and D.J. Roulston, "Electron and hole mobilities in silicon as a function of concentration and temperature, " IEEE Transactions on Electron Devices, vol. 29, Feb. 1982, pp. 292-295.
-
(1982)
IEEE Transactions on Electron Devices
, vol.29
, pp. 292-295
-
-
Arora, N.D.1
Hauser, J.R.2
Roulston, D.J.3
|