Synthesis of Cu-Pd alloy thin films by co-electrodeposition

Electrochimica Acta

Volumn 56, Issue 21, 2011, Pages 7397-7403

  Allemand, Morgan ^a   Martin, Manuel H ^a   Reyter, David ^a   Roué, Lionel ^a   Guay, Daniel ^a   Andrei, Carmen ^b   Botton, Gianluigi A ^b  

^a INRS EMT   (Canada)

^b MCMASTER UNIVERSITY   (Canada)

Author keywords

Palladium copper alloy; Potential pulse electrodeposition; Potentiostatic electrodeposition

Indexed keywords

CO-ELECTRODEPOSITION; COMPOSITION RANGES; DEPOSITED FILMS; DEPOSITION CONDITIONS; DOUBLE-LAYER CAPACITANCE; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; ELECTRODE POTENTIALS; ELECTROLYTIC BATHS; FACE-CENTERED CUBIC STRUCTURE; NANOCRYSTALLINES; PALLADIUM-COPPER ALLOYS; POTENTIAL PULSE; POTENTIOSTATIC ELECTRODEPOSITION; POTENTIOSTATICS; SCANNING ELECTRONS; TI SUBSTRATES;

ALLOYS; CAPACITANCE MEASUREMENT; COPPER ALLOYS; ELECTROCATALYSIS; ELECTRODEPOSITION; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM ALLOYS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

COPPER;

EID: 80051792207     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.05.052     Document Type: Article

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