BST films grown by metal organic chemical vapor deposition incorporating real-time control of stoichiometry

Integrated Ferroelectrics

Volumn 111, Issue 1, 2009, Pages 17-26

  Boyd, David A ^a   Hirsch, S G ^b   Hubbard, C ^b   Cole, M W ^b  

^a California Institute of Technology   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

BST; Ferroelectric thin films; MOCVD

Indexed keywords

BST; BST FILM; CRYSTALLINE STRUCTURE; MGO; PRECURSOR FLUX; REAL TIME MONITORING; TIO; UV ABSORPTION SPECTROSCOPY;

CRYSTALLOGRAPHY; FERROELECTRIC THIN FILMS; FERROELECTRICITY; GROWTH (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; PIEZOELECTRIC DEVICES; PIEZOELECTRICITY; REAL TIME CONTROL; SAPPHIRE; STOICHIOMETRY; VAPORS;

FILMS;

EID: 80051677965     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584580903586638     Document Type: Conference Paper

References (6)

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4. M. W. Cole, W. D. Nothwang, P. C. Joshi, S. Hirsch, J. D. Demaree, Integr. Ferroelectr. 71, 29 (2005).
5. A. B. Tripathi. Ph.D. thesis, California Institute of Technology, Pasadena CA, (2001).
6. M. El-Naggar, D. Boyd, and D. Goodwin, J. Mater. Res. 20, 2969 (2005).