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Volumn 21, Issue 8, 2011, Pages

Adhesive wafer bonding using a molded thick benzocyclobutene layer for wafer-level integration of MEMS and LSI

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE WAFER BONDING; BENZOCYCLOBUTENE; GLASS MOLDS; GLASS SUBSTRATES; METAL ELECTRODES; MICRO ELECTRO MECHANICAL SYSTEM; POLYMERIZATION DEGREE; WAFER BONDING PROCESS; WAFER-LEVEL INTEGRATION;

EID: 80051500535     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/8/085002     Document Type: Article
Times cited : (17)

References (13)
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  • 3
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    • Benzocyclobutene (BCB) dielectrics for the fabrication of high density, thin film multichip modules
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  • 4
    • 80051518722 scopus 로고    scopus 로고
    • Dow Chemical Company Processing Procedures for CYCLOTENE 3000 Series Dry Etch Resins 2005
    • (2005)
    • Chemical Company, D.1
  • 5
    • 0039304077 scopus 로고    scopus 로고
    • On the mechanical reliability of photo-BCB-based thin film dielectric polymer for electronic packaging applications
    • Im J-H et al 2000 On the mechanical reliability of photo-BCB-based thin film dielectric polymer for electronic packaging applications J. Electron. Packag. 122 28-33
    • (2000) J. Electron. Packag. , vol.122 , Issue.1 , pp. 28-33
    • Im, J.-H.1
  • 7
    • 2442669253 scopus 로고    scopus 로고
    • Wafer-level packaging technology for high-Q on-chip inductors and transmission lines
    • Carchon G J, Raedt W D and Beyne E 2004 Wafer-level packaging technology for high-Q on-chip inductors and transmission lines IEEE Trans. Microw. Theory Tech. 52 1244-51
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    • Carchon, G.J.1    Raedt, W.D.2    Beyne, E.3
  • 8
    • 24644439334 scopus 로고    scopus 로고
    • Wafer bonding of damascene-patterned metal/adhesive redistribution layers for via-first three-dimensional (3D) interconnect
    • 2005 Proceedings - 55th Electronic Components and Technology Conference, ECTC
    • MacMahon J J, Lu J-Q and Gutsmann RJ 2005 Wafer bonding of damascene-patterned metal/adhesive redistribution layers for via-first 3D interconnect Proc. IEEE Electronic Components and Technology Conf. pp 331-6 (Pubitemid 41276193)
    • (2005) Proceedings - Electronic Components and Technology Conference , vol.1 , pp. 331-336
    • McMahon, J.J.1    Lu, J.-Q.2    Gutmann, R.J.3
  • 10
    • 0031677948 scopus 로고    scopus 로고
    • Taguchi optimization for the processing of EPON SU-8 resist
    • Eyre D W B and Blosiu J 1998 Taguchi optimization for the processing of EPON SU-8 resist Proc. IEEE MEMS '98 pp 218-22
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    • Eyre, D.W.B.1    Blosiu, J.2
  • 11
    • 0031170437 scopus 로고    scopus 로고
    • Planarization techniques for vertically integrated metallic MEMS on silicon foundry circuits
    • PII S0960131797808133
    • Lee J-B, English J, Ahn C-H and Allen M G 1997 Planarization techniques for vertically integrated metallic MEMS on silicon foundry circuits J. Micromech. Microeng. 7 44-54 (Pubitemid 127627442)
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    • Lee, J.-B.1    English, J.2    Ahn, C.-H.3    Allen, M.G.4
  • 13
    • 0034275266 scopus 로고    scopus 로고
    • The surface structure of Dow Cyclotene 3022, as determined by photoacoustic FTIR, confocal Raman and photoelectron spectroscopies
    • Poulin S, Yang D Q, Sacher E, Hyett C and Ellis T H 2000 The surface structure of Dow Cyclotene 3022, as determined by photoacoustic FTIR, confocal Raman and photoelectron spectroscopies Appl. Surf. Sci. 165 15-22
    • (2000) Appl. Surf. Sci. , vol.165 , Issue.1 , pp. 15-22
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.