Positive ion emission from oxidized aluminum during ultraviolet excimer laser irradiation

Journal of Applied Physics

Volumn 110, Issue 2, 2011, Pages

  Khan, Enamul ^a   Langford, S C ^a   Dickinson, J T ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM METAL; EMISSION INTENSITY; ETCHING TREATMENT; INTENSE EMISSION; ION ETCHING; ION KINETIC ENERGY; LASER FLUENCES; LASER INDUCED; METALLIC ALUMINUM; OPTICAL BREAKDOWN; PHOTON ENERGY; POSITIVE ION EMISSION; PULSED EXCIMER LASERS; QUADRUPOLES; RAPID ETCHING; SURFACE ELECTRON; THIN OXIDES; TIME OF FLIGHT MEASUREMENTS; UNEXPOSED MATERIALS; WORK FOCUS;

ALUMINUM; ETCHING; EXCIMER LASERS; IRRADIATION; KINETIC ENERGY; METALLIC COMPOUNDS; NEGATIVE IONS; POSITIVE IONS; ULTRAVIOLET LASERS;

PULSED LASERS;

EID: 79961104254     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3608152     Document Type: Article

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