The effect of thermal oxidation on laser-induced photoelectron emission during tensile deformation of polycrystalline aluminum

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Cai, M ^a,b   Ricker, R E ^c   Levine, L E ^c   Langford, S C ^a   Dickinson, J T ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

^b SOUTHEAST UNIVERSITY   (China)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TREATMENTS; DEFORMATION PROCESS; INTERFACE STATE; LASER INDUCED; METALLIC ALUMINUM; OXIDE THICKNESS; PHOTO-ELECTRON EMISSION; PHOTOELECTRON INTENSITIES; PHOTOELECTRON SIGNALS; PHOTON ENERGY; POLYCRYSTALLINE ALUMINUM; PRE-TREATMENTS; REACTIVE METALS; SENSITIVE PROBE; SURFACE OXIDE; SURFACE OXIDE FILMS; TENSILE DEFORMATION; THERMAL OXIDATION; THERMAL OXIDES; TIME OF FLIGHT MEASUREMENTS; UV RADIATION;

ALUMINUM; DEFORMATION; OXIDATION; OXIDE FILMS; OXIDES; PHOTOELECTRONS; PHOTOIONIZATION; PHOTONS; PROBES; TENSILE TESTING; ULTRAVIOLET RADIATION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77949689145     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3327237     Document Type: Article

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