Nonlinear absorption of thin Al2O3 films at 193 nm

Applied Optics

Volumn 39, Issue 18, 2000, Pages 3165-3169

  Apel, Oliver ^a   Mann, Klaus ^a   Zoeller, Alfons ^c   Goetzelmann, Rainer ^c   Eva, Eric ^a,b  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ALUMINUM COMPOUNDS; CALORIMETERS; PHOTONS;

NONLINEAR ABSORPTION;

THIN FILMS;

EID: 0001254276     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.003165     Document Type: Article

References (11)

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9. E. Eva and K. Mann, “Characterizing the absorption and aging behavior of DUV optical material by high-resolution excimer laser calorimetry, ” in Optical Microlithography XI, L. Van den Hove, ed., Proc. SPIE 3334, 1055-1061 (1998).
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11. S. Schippel, Layertec GmbH, Blankenhainer Strasse 169, D-99441 Mellingen, Germany (personal communication).