Interaction of vacuum ultraviolet excimer laser radiation with fused silica. III. Negative ion formation

Journal of Applied Physics

Volumn 107, Issue 3, 2010, Pages 2259-

  George, Sharon R ^a   Langford, S C ^a   Dickinson, J T ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-BONDING STATE; ANTIBONDING; AS ANNEALING; CHEMICAL STATE; DEFECT SITES; EMISSION INTENSITY; FLUENCES; HARTREE-FOCK; HYBRID MECHANISMS; ION EMISSIONS; ION KINETIC ENERGY; MECHANICAL DAMAGES; OPTICAL BREAKDOWN; POSITIVE ION EMISSION; REPULSIVE ELECTROSTATIC FORCE; SENSITIVE PROBE; SILICA SURFACE; VACUUM ULTRAVIOLETS; ELECTRON ATTACHMENT; ELECTROSTATIC POTENTIALS; NEUTRAL ATOMS; NEUTRAL PARTICLES; TIME OF FLIGHT; TIME RESOLVED MEASUREMENT;

EXCIMER LASERS; GAS LASERS; LASER RADIATION; OXIDES; POSITIVE IONS; PULSED LASER APPLICATIONS; PULSED LASERS; SILICA; SURFACE DEFECTS; ULTRAVIOLET LASERS; NEGATIVE IONS; SILICON COMPOUNDS;

FUSED SILICA;

EID: 76949084678     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.3290945     Document Type: Article

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