Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents

Physica Status Solidi - Rapid Research Letters

Volumn 5, Issue 8, 2011, Pages 262-264

  Kim, Seong Keun ^a   Han, Sora ^a   Han, Jeong Hwan ^a   Lee, Woongkyu ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

Author keywords

Atomic layer deposition; Iridium; TiO2

Indexed keywords

CRYSTALLINE STRUCTURE; DIELECTRIC CONSTANTS; FEEDING TIME; LEAKAGE PROPERTY; OXYGEN SOURCES; TIO; ULTRALOW LEAKAGE;

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; IRIDIUM; LEAKAGE CURRENTS; OXIDE MINERALS;

TITANIUM DIOXIDE;

EID: 79961083396     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201105250     Document Type: Article

References (12)

1. S. K. Kim et al., Appl. Phys. Lett. 85, 4112 (2004).
2. S. K. Kim et al., J. Appl. Phys. 102, 024109 (2007).
3. K. Fröhlich et al., Electrochem. Solid-State Lett. 11, G19 (2008).
4. M. Popovici et al., Phys. Status Solidi RRL 5, 19 (2011).
5. G.-J. Choi et al., J. Electrochem. Soc. 156, G138 (2009).
6. S. K. Kim et al., Electrochem. Solid-State Lett. 9, F5 (2006).
7. S. K. Kim et al., Adv. Mater. 20, 1429 (2008).
8. S. K. Kim et al., Adv. Func. Mater. 20, 2989 (2010).
9. I. S. Jeon et al., IEEE Int. Electron Devices Meet. 303 (2004).
10. C.-H. Lu et al., J. Appl. Phys. 107, 063710 (2010).
11. S. K. Kim et al., Chem. Mater. 20, 3723 (2008).
12. C. Kittel, Quantum Theory of Solids, 2nd ed. (Wiley, 1987).