Optical attenuation in ion-implanted silicon waveguide racetrack resonators

Optics Express

Volumn 19, Issue 16, 2011, Pages 14913-14918

  Doylend, J K ^a   Jessop, P E ^b   Knights, A P ^a  

^a MCMASTER UNIVERSITY   (Canada)

^b WILFRID LAURIER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTROMAGNETIC WAVE ABSORPTION; IONS; LIGHT ABSORPTION; RESONATORS; WAVEGUIDES;

ANNEALING TEMPERATURES; EXPERIMENTAL PROCEDURE; IMPLANTATION DAMAGE; ION-IMPLANTED SILICON; OPTICAL ATTENUATION; OUTPUT CHARACTERISTICS; RACETRACK RESONATORS; SILICON WAVEGUIDE;

ION IMPLANTATION;

EID: 79961066969     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.014913     Document Type: Article

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