메뉴 건너뛰기




Volumn 50, Issue 21, 2011, Pages 4180-4188

Ultraviolet antireflection coatings for use in silicon detector design

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COATINGS; EFFICIENCY; FILM PREPARATION; HAFNIUM OXIDES; REFRACTIVE INDEX; SILICON DETECTORS; SILICON OXIDES; SILICON WAFERS;

EID: 79960641430     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.004180     Document Type: Article
Times cited : (38)

References (31)
  • 1
    • 2342494723 scopus 로고    scopus 로고
    • Scientific Charge-Coupled Devices
    • J. R. Janesick, Scientific Charge-Coupled Devices (SPIE, 2001).
    • (2001) SPIE
    • Janesick, J.R.1
  • 10
    • 0009683740 scopus 로고
    • Growth of a delta-doped silicon layer by molecular beam epitaxy on a charge-coupled device for reflection-limited ultraviolet quantum efficiency
    • M. E. Hoenk, P. J. Grunthaner, F J. Grunthaner, R. W Terhune, M. Fattahi, and H.-F Tseng, "Growth of a delta-doped silicon layer by molecular beam epitaxy on a charge-coupled device for reflection-limited ultraviolet quantum efficiency," Appl. Phys. Lett. 61, 1084-1086 (1992).
    • (1992) Appl. Phys. Lett. , vol.61 , pp. 1084-1086
    • Hoenk, M.E.1    Grunthaner, P.J.2    Grunthaner, F.J.3    Terhune, R.W.4    Fattahi, M.5    Tseng, H.-F.6
  • 12
    • 85087604087 scopus 로고    scopus 로고
    • Antireflection coatings for astronomical silicon imagers in optical interference coatings
    • Optical Society of America paper ThD3
    • J. Blacksberg and S. Nikzad, "Antireflection coatings for astronomical silicon imagers," in Optical Interference Coatings, OSA Technical Digest (CD) (Optical Society of America, 2007), paper ThD3.
    • (2007) OSA Technical Digest (CD)
    • Blacksberg, J.1    Nikzad, S.2
  • 16
    • 79955606576 scopus 로고    scopus 로고
    • A system and methodologies for absolute QE measurements from the vacuum ultraviolet through the NIR
    • B. C. Jacquot, S. P. Monacos, M. E. Hoenk, F Greer, T. J. Jones, and S. Nikzad, "A system and methodologies for absolute QE measurements from the vacuum ultraviolet through the NIR," Rev. Sci. Instrum. 82, 043101 (2011).
    • (2011) Rev. Sci. Instrum. , vol.82 , pp. 043101
    • Jacquot, B.C.1    Monacos, S.P.2    Hoenk, M.E.3    Greer, F.4    Jones, T.J.5    Nikzad, S.6
  • 19
    • 84975598523 scopus 로고
    • Vacuum ultraviolet thin films. I: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films
    • M. Zukic, D. G. Torr, J. F Spann, and M. R. Torr, "Vacuum ultraviolet thin films. I: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films," Appl. Opt. 29, 4284-4292 (1990).
    • (1990) Appl. Opt. , vol.29 , pp. 4284-4292
    • Zukic, M.1    Torr, D.G.2    Spann, J.F.3    Torr, M.R.4
  • 20
    • 84975597832 scopus 로고
    • Vacuum ultraviolet thin films. II: Vacuum ultraviolet all-dielectric narrowband filters
    • M. Zukic, D. G. Torr, J. F Spann, and M. R. Torr, "Vacuum ultraviolet thin films. II: Vacuum ultraviolet all-dielectric narrowband filters," Appl. Opt. 29, 4293-4302 (1990).
    • (1990) Appl. Opt. , vol.29 , pp. 4293-4302
    • Zukic, M.1    Torr, D.G.2    Spann, J.F.3    Torr, M.R.4
  • 21
    • 36149016256 scopus 로고
    • Optical constants of silicon in the region 1 to 10 ev
    • H. R. Philipp and E. A. Taft, "Optical constants of silicon in the region 1 to 10 ev," Phys. Rev. 120, 37-38 (1960).
    • (1960) Phys. Rev. , vol.120 , pp. 37-38
    • Philipp, H.R.1    Taft, E.A.2
  • 22
    • 64349109641 scopus 로고    scopus 로고
    • 3 atomic layer deposition with trimethylaluminum and ozone studied by in situ transmission FTIR spectroscopy and quadrupole mass spectrometry
    • 3 atomic layer deposition with trimethylaluminum and ozone studied by in situ transmission FTIR spectroscopy and quadrupole mass spectrometry," J. Phys. Chem. C 112, 19530-19539 (2008).
    • (2008) J. Phys. Chem. C , vol.112 , pp. 19530-19539
    • Goldstein, D.N.1    McCormick, J.A.2    George, S.M.3
  • 27
    • 0021007804 scopus 로고
    • Recent developments in ultraviolet filters and coatings
    • B. K. Flint, "Recent developments in ultraviolet filters and coatings," Adv. Space Res. 2, 135-142 (1982).
    • (1982) Adv. Space Res. , vol.2 , pp. 135-142
    • Flint, B.K.1
  • 28
    • 0016966959 scopus 로고
    • Multilayer interference mirrors for the XUV range around 100 eV photon energy
    • R. Haelbich and C. Kunz, "Multilayer interference mirrors for the XUV range around 100 eV photon energy," Opt. Commun. 17, 287-292 (1976).
    • (1976) Opt. Commun. , vol.17 , pp. 287-292
    • Haelbich, R.1    Kunz, C.2
  • 29
    • 0000849463 scopus 로고
    • Low-loss reflection coatings using absorbing materials
    • E. Spiller, "Low-loss reflection coatings using absorbing materials," Appl. Phys. Lett. 20, 365-367 (1972).
    • (1972) Appl. Phys. Lett. , vol.20 , pp. 365-367
    • Spiller, E.1
  • 30
  • 31
    • 77949291119 scopus 로고    scopus 로고
    • A 5.5 Mpixel 100 frames/sec wide dynamic range low noise CMOS image sensor for scientific applications
    • B. Fowler, C. Liu, S. Mims, J. Balicki, W. Li, H. Do, J. Appelbaum, and P. Vu, "A 5.5 Mpixel 100 frames/sec wide dynamic range low noise CMOS image sensor for scientific applications," Proc. SPIE 7536, 753607 (2010).
    • (2010) Proc. SPIE , vol.7536 , pp. 753607
    • Fowler, B.1    Liu, C.2    Mims, S.3    Balicki, J.4    Li, W.5    Do, H.6    Appelbaum, J.7    Vu, P.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.