SCOPUS 정보 검색 플랫폼

Volumn 27, Issue 5, 2011, Pages 376-381

Effect of doping level on physical properties of antimony doped nanocrystalline tin oxide films fabricated using low cost spray technique

(5) Muruganantham, G a Ravichandran, K a Saravanakumar, K a Philominathan, P a Sakthivel, B a

a A V V M SRI PUSHPAM COLLEGE (India)

Author keywords

EDS; Electrical properties; Solar cells; Spray pyrolysis; Structural properties; Tin oxide

Indexed keywords

AFM IMAGE; ANTIMONY DOPING; ANTIMONY-DOPED TIN OXIDE; CASSITERITE STRUCTURE; DOPING CONCENTRATION; DOPING LEVELS; EFFECT OF DOPING; ELECTRICAL PROPERTY; FABRICATION TECHNIQUE; LOW COSTS; MINIMUM VALUE; NANOCRYSTALLINES; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; SPRAY TECHNIQUE; STARTING SOLUTIONS;

DIFFRACTION; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FABRICATION; NANOCOMPOSITES; NANOCRYSTALLINE ALLOYS; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; TIN; TIN OXIDES; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 79960282792 PISSN: 02670844 EISSN: 17432944 Source Type: Journal
DOI: 10.1179/1743294410Y.0000000017 Document Type: Article

Times cited : (22)

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