Growth behavior and electrical properties of a (Na0.5K 0.5)NbO3thin film deposited on a Pt/Ti/SiO2/Si substrate using RFmagnetron sputtering

Journal of the American Ceramic Society

Volumn 94, Issue 7, 2011, Pages 1970-1973

  Kang, Lee Seung ^a   Kim, Bo Yun ^a   Seo, In Tae ^a   Seong, Tae Geun ^a   Kim, Jin Seong ^a   Sun, Jong Woo ^a   Paik, Dong Soo ^a   Hwang, Inrok ^b   Park, Bae Ho ^b   Nahm, Sahn ^a  

^a Korea University   (South Korea)

^b Konkuk University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DISSIPATION FACTORS; ELECTRIC AND DIELECTRIC PROPERTIES; GROWTH BEHAVIOR; HIGH DIELECTRIC CONSTANTS; LOW-LEAKAGE CURRENT; RF-MAGNETRON SPUTTERING; SECOND PHASE;

DIELECTRIC PROPERTIES; NIOBIUM OXIDE;

SODIUM;

EID: 79960244315     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04574.x     Document Type: Article

References (19)

1. B. Jaffe, W. R. Cook, and, H. Jaffe, Piezoelectric Ceramics. Academic, New York, 1971, 140pp.
2. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, and, M. Nakamura, " Lead-Free Piezoceramics," Nature, 432 [7013] 84-7 (2004). (Pubitemid 39496798)
3. 3 Lead-Free Piezoceramics," Appl. Phys. Lett., 88 [21] 212908-10 (2006).
4. 3 Ceramics," Appl. Phys. Lett., 87 [18] 182905-7 (2005).
5. 3 Ceramics," Appl. Phys. Lett., 89 [6] 062906-8 (2006).
6. 3 Ceramics," J. Appl. Phys., 102 [12] 124101-5 (2007).
7. 3 Thin Films by Pulsed-Laser Deposition," Appl. Phys. Lett., 75 [2] 268-70 (1999). (Pubitemid 129561901)
8. 3 Substrates," J. Appl. Phys., 103 [10] 104106-11 (2008).
9. 3 Thick Films Derived from Polyvinylpyrrolidone- Modified Chemical Solution Deposition," Appl. Phys. Lett., 93 [9] 092903-5 (2008).
10. 3 Thin Films on Sapphire Substrates," Appl. Phys. Lett., 82 [3] 439-41 (2003).
11. 3 Thin Films Prepared by Radio Frequency Magnetron Sputtering," Appl. Phys. Lett., 94 [9] 092902-4 (2009).
12. 3 Thin Films," Appl. Phys. Lett., 73 [7] 927-9 (1998). (Pubitemid 128671714)
13. 3 Thin Film," J. Appl. Phys., 106 [6] 066101-3 (2009).
14. 2/Si Thin Film Varactor," Appl. Phys. Lett., 76 [13] 1761-3 (1999).
15. 3," Appl. Phys. Lett., 92 [21] 212903-5 (2008).
16. 3 Thin Films Using Metal-Organic Chemical Vapor Deposition," Integr. Ferroelectr., 45, 39-48 (2002). (Pubitemid 44798143)
17. 3 Thick Films by Aerosol Deposition," Appl. Phys. Lett., 90 [15] 152901-3 (2007).
18. M. Abazari, T. Choi, S.-W. Cheong, and, A. Safari, " Nanoscale Characterization and Local Piezoelectric Properties of Lead-Free KNN-LT-LS Thin Films," J. Phys. D: Appl. Phys., 43, 025405, 9pp (2010).
19. 3 Thin Films Derived from Metal Alkoxide Precursors," Jpn. J. Appl. Phys., 46, L311-3 (2007). (Pubitemid 47252403)