(Na,K)NbO3 thin films using metalorganic chemical vapor deposition

Integrated Ferroelectrics

Volumn 45, Issue , 2002, Pages 39-48

  Cho, Choong Rae ^a,b   Moon, Byung Moo ^a  

^a Korea University   (South Korea)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

(Na,K)NbO3 thin film; Ferroelectrics; Metalorganic chemical vapor deposition (MOCVD); Preferential orientation

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ELECTRON SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NIOBIUM COMPOUNDS; PERMITTIVITY; SYNTHESIS (CHEMICAL);

HOT WALL REACTORS; PRECURSORS; TETRAMETHYL HEPTANEDIONATE (THD);

FERROELECTRIC THIN FILMS;

EID: 10444274482     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/713718216     Document Type: Article

References (11)

1. C. -R. Cho and A. Grishin, Appl. Phys. Lett. 75 (1999) 268.
2. C. -R. Cho and A. Grishin, J. Appl. Phys. 87 (2000) 4439.
3. C. -R. Cho, I. Katardjiev, M. Grishin, and A. Grishin, in press, Appl. Phys. Lett. 80 (2002) 3171.
4. C. -R. Cho, J. Koh, A. Grishin, S. Abadei, S. Gevorgian. Appl. Phys. Lett. 76 (2000) 1761.
5. C. -R. Cho and A. Grishin, Integrated Ferroelectrics, 39 (2001) 403.
6. X. Wang, U. Helmersson, S. Olasfsson, S. Rudner, L. D. Wernlund, and S. Gevorgian, Appl. Phys. Lett. 73 (1998) 927.
7. A. Shibuya, J. Koh, A. Grishin, V. Kugler, D. Music, U. Helmersson, M. Okuyama, Mat. Res. Soc. Proc. 688 (2002) C7.7.
8. A. A. Wernberg, H. J. Gysling, A. J. Filo, and T. N. Blanton, Appl. Phys. Lett. 62 (1993) 946.
9. M. J. Nystrom, B. W. Wessels, D. B. Studebaker, T. J. Marks, W. P. Lin, and G. K. Wong, Appl. Phys. Lett. 67 (1995) 365.
10. J. -P. Han, T. P. Ma, Appl. Phys. Lett. 72 (1998) 1185.
11. C. -R. Cho, Ph. D. Thesis, Dept. of Physics, Royal Institute of Technology, Stockholm, Sweden (2001).