Investigation on the effect of Zr doping in ZnO thin films by spray pyrolysis

Applied Surface Science

Volumn 257, Issue 21, 2011, Pages 9068-9072

  Gokulakrishnan, V ^a   Parthiban, S ^b   Jeganathan, K ^a   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

^b UNINOVA   (Portugal)

Author keywords

Atomic force microscopy; Optical properties and electrical properties; Thin films; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; CRYSTAL STRUCTURE; II-VI SEMICONDUCTORS; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE; ZIRCONIUM COMPOUNDS;

DOPING CONCENTRATION; HEXAGONAL CRYSTAL STRUCTURE; POLYCRYSTALLINE GRAINS; ROOM TEMPERATURE PHOTOLUMINESCENCE SPECTRUMS; SPRAY PYROLYSIS METHOD; SUBSTRATE TEMPERATURE; X-RAY DIFFRACTION STUDIES; ZIRCONIUM-DOPED ZINC OXIDES;

OPTICAL FILMS;

EID: 79960180913     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.05.102     Document Type: Article

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