Mechanistic study of lift-off for continuous metal layers after T-NIL

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2056-2058

  Mayer, Andre ^a   Möllenbeck, Saskia ^a   Dhima, Khalid ^a   Wang, Si ^a   Scheer, Hella Christin ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Lift off; Sputtering; Thermal nanoimprint lithography

Indexed keywords

GEOMETRY FACTORS; IMPRINTED STRUCTURES; LAYER DEPOSITION; LIFT-OFF; MECHANISTIC STUDIES; METAL LAYER; METALLIC PATTERNS; SIDEWALL ANGLES; THERMAL NANOIMPRINT; THERMAL NANOIMPRINT LITHOGRAPHY; ULTRASONIC AGITATION;

ORGANIC SOLVENTS; POLYSTYRENES; TOLUENE;

NANOIMPRINT LITHOGRAPHY;

EID: 79960048942     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.020     Document Type: Conference Paper

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