Ultrasmooth gold films via pulsed laser deposition

Advanced Functional Materials

Volumn 21, Issue 13, 2011, Pages 2587-2592

  Ng, Doris K T ^a   Bhola, Bipin S ^a   Bakker, Reuben M ^a   Ho, Seng Tiong ^a,b  

^a AGENCY FOR SCIENCE   (Singapore)

^b Northwestern University   (United States)

Author keywords

Au; gold; pulsed laser deposition; surface plasmon resonance

Indexed keywords

GOLD FILM; LOW LOSS; NITROGEN FLOW; NITROGEN GAS PRESSURE; ONE STEP; PLASMA PLUMES; PROCESS PARAMETERS; ROOT MEAN SQUARE ROUGHNESS; SILICON SUBSTRATES; SINGLE-STEP; SUBSTRATE ROUGHNESS; SURFACE PLASMONS;

DEPOSITION; GOLD; GOLD DEPOSITS; METALLIC FILMS; NITROGEN; NITROGEN PLASMA; PLASMONS; PULSED LASER DEPOSITION; PULSED LASERS; SURFACE PLASMON RESONANCE; SURFACE ROUGHNESS; THICK FILMS;

GOLD COATINGS;

EID: 79959951321     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201002303     Document Type: Article

References (27)

1. H. Raether, Surface Plasmons on Smooth and Rough Surfaces and on Gratings, Springer-Verlag, Berlin 1988.
2. A. Polman, H. A. Atwater, Materials Today 2005, 8, 56.
3. W. L. Barnes, A. Dereux, T. W. Ebbesen, Nature 2003, 424, 824.
4. A. V. Zayats, I. I. Smolyaninov, J. Opt. A: Pure Appl. Opt. 2003, 5, S16.
5. K. P. Chen, V. P. Drachev, J. D. Borneman, A. V. Kildishev, V. M. Shalaev, Nano Lett. 2010, 10, 916.
6. P. Nagpal, N. C. Lindquist, S. H. Oh, D. J. Norris, Science 2009, 325, 594.
7. V. J. Logeeswaran, N. P. Kobayashi, M. S. Islam, W. Wu, P. Chaturvedi, N. X. Fang, S. Y. Wang, R. S. Williams, Nano Lett. 2009, 9, 178.
8. S. H. Kwon, J. H. Kang, C. Seassal, S. K. Kim, P. Regreny, Y. H. Lee, C. M. Lieber, H. G. Park, Nano Lett. 2010, 10, 3679.
9. H. Huang, S. Zhang, L. Qi, X. Yu, Y. Chen, Surf. Coatings Technol. 2006, 200, 4389.
10. S. Palomba, R. E. Palmer, J. Appl. Phys. 2007, 101, 044304.
11. M. Higo, K. Fujita, Y. Tanaka, M. Mitsushio, T. Yoshidome, Appl. Surf. Sci. 2001, 252, 5083.
12. L. Maya, C. E. Vallet, Y. H. Lee, J. Vac. Sci. Technol. A 1997, 15, 238.
13. X. Zhu, Y. Zhang, J. Zhang, J. Xu, Y. Ma, Z. Li, D. Yu, Adv. Mater. 2010, 22, 4345.
14. C. Aruta, S. Amoruso, R. Bruzzese, X. Wang, D. Maccariello, F. M. Granozio, U. Scotti di Uccio, Appl. Phys. Lett. 2010, 97, 252105.
15. Q. Z. Qin, Z. W. Fu, Adv. Mater. 1999, 11, 1119.
16. J. T. Cheung, J. S. Horwitz, MRS Bull. 1992, 17, 30.
17. Y. Franghiadakis, C. Fotakis, P. Tzanetakis, J. Appl. Phys. 1998, 84, 1090.
18. Y. Franghiadakis, C. Fotakis, P. Tzanetakis, Appl. Phys. A 1999, 68, 391.
19. P. Merel, M. Chaker, M. Tabbal, K. Pepin, Appl. Surf. Sci. 2001, 177, 165.
20. C. B. Arnold, M. J. Aziz, Appl. Phys. A 1999, 69, 23.
21. J. E. Lennard-Jones, Proc. R. Soc. London, Ser. A 1937, 163, 127.
22. S. Bakalova, A. Szekeres, G. Huhn, K. Havancsak, S. Grigorescu, G. Socol, C. Ristoscu, I. N. Mihailescu, Vacuum 2010, 84, 155.
23. J. Baek, J. Ma, M. F. Becker, J. W. Keto, D. Kovar, Thin Solid Films 2007, 515, 7096.
24. I. N. Mihailescu, V. S. Teodorescu, E. Gyorgy, A. Luches, A. Perrone, M. Martino, J. Phys. D: Appl. Phys. 1998, 31, 2236.
25. M. N. R. Ashfold, F. Claeyssens, G. M. Fuge, S. J. Henley, Chem. Soc. Rev. 2004, 33, 23.
26. M. S. Tillack, D. W. Blair, S. S. Harilal, Nanotechnology 2004, 15, 390.
27. P. M. Ossi, C. E. Bottani, A. Miotello, Thin Solid Films 2005, 482, 2.