Plasma surface modification of powders for pharmaceutical applications

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Roth, Christian ^a   Künsch, Zaira ^a   Sonnenfeld, Axel ^a   Rudolf von Rohr, Philipp ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Dusty plasma; Flowability; Particle size distribution; Particle treatment; Plasma downstream reactor; Plasma enhanced chemical vapor deposition

Indexed keywords

BULK DENSITY; COHESIVE POWDER; COMPARATIVE STUDIES; DUSTY PLASMAS; FLOW FACTORS; FLOWABILITY; GLIDANTS; INTERPARTICLE FRICTION; LOW-TEMPERATURE PLASMA TREATMENT; MEAN PARTICLE SIZE; PHARMACEUTICAL APPLICATIONS; PLASMA SURFACE MODIFICATIONS; POWDER FLOWABILITY; POWDER FRACTIONS; SCANNING ELECTRON MICROSCOPE; SUBSTRATE PARTICLES;

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRENGTH; FLUIDITY; PARTICLE SIZE; PARTICLE SIZE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POWDERS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SUGARS; SURFACE ROUGHNESS; VAN DER WAALS FORCES;

PLASMA DEPOSITION;

EID: 79959778355     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.10.046     Document Type: Article

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