Plasma enhanced chemical vapor deposition on particulate solid-state materials for improved powder processing

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Sonnenfeld, Axel ^a   Roth, Christian ^a   Dimitrova, Zorica ^a   Spillmann, Adrian ^a   Von Rohr, Philipp Rudolf ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Hexamethyldisiloxane (HMDSO); Particles; Plasma enhanced chemical vapor deposition (PECVD); Powder compressibility; Powder flowability

Indexed keywords

COMPRESSION RATIOS; DISCHARGE POWER; FLOWABILITY; FLOWRATE RATIO; HEXAMETHYL DISILOXANE; HIGH PRESSURE; MASS DENSITIES; PARTICULATE SOLIDS; PLASMA EXPOSURE; PLASMA PROCESS; POWDER BULK; POWDER COMPRESSIBILITY; POWDER FLOWABILITY; POWDER PROCESSING; PROCESSABILITY; PRODUCTION LINE; RADIO FREQUENCY DISCHARGES; RF-POWER;

ARGON; COMPRESSIBILITY; COMPRESSIVE STRENGTH; ELECTRIC DISCHARGES; GRAVITATION; HIGH PRESSURE ENGINEERING; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICA; SUGARS; VAPOR DEPOSITION;

PLASMA DEPOSITION;

EID: 77954923899     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200932202     Document Type: Conference Paper

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