-
2
-
-
0003666038
-
-
S. M. Rossnagel, J. J. Cuomo, W. D. Westwood, Eds, Noyes Publications, Park Ridge
-
Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions, S. M. Rossnagel, J. J. Cuomo, W. D. Westwood, Eds., Noyes Publications, Park Ridge 1990.
-
(1990)
Handbook of plasma processing technology: Fundamentals, etching, deposition, and surface interactions
-
-
-
3
-
-
23044472709
-
-
K. Reichel, R. Fellenberg, R. Kickuth, Eds, German Federal Ministry of Education, Department of Public Relations, Bonn
-
Plasma Technology - Process Diversity and Sustainability, K. Reichel, R. Fellenberg, R. Kickuth, Eds., German Federal Ministry of Education, Department of Public Relations, Bonn 2001.
-
(2001)
Plasma Technology - Process Diversity and Sustainability
-
-
-
5
-
-
67651239321
-
Plasmas in Deposition Processes
-
2nd edition, R. F. Bunshah, Ed, Noyes Publications 55, Park Ridge
-
J. A. Thornton, J. E. Greene, "Plasmas in Deposition Processes", in: Handbook of Deposition Technologies for Films and Coatings, 2nd edition, R. F. Bunshah, Ed., Noyes Publications 55, Park Ridge 1990.
-
(1990)
Handbook of Deposition Technologies for Films and Coatings
-
-
Thornton, J.A.1
Greene, J.E.2
-
6
-
-
67651239212
-
-
PhD thesis No. 16291, ETH, Zurich
-
C. Arpagaus, PhD thesis No. 16291, ETH, Zurich 2005.
-
(2005)
-
-
Arpagaus, C.1
-
7
-
-
67651223910
-
-
N. T. Rosell, PhD thesis B.33414-2007, Institut Químic de Sarriá, Ramon Llull University, Barcelona 2007.
-
N. T. Rosell, PhD thesis B.33414-2007, Institut Químic de Sarriá, Ramon Llull University, Barcelona 2007.
-
-
-
-
8
-
-
12144264440
-
-
C. Arpagaus, A. Sonnenfeld, Ph. Rudolf von Rohr, Chem. Eng. Technol. 2005, 28, 87.
-
(2005)
Chem. Eng. Technol
, vol.28
, pp. 87
-
-
Arpagaus, C.1
Sonnenfeld, A.2
Rudolf von Rohr, P.3
-
10
-
-
67651217674
-
-
US 5 234 723 1990, Polar Materials Inc, Martins Creek, PA, inv. R. J. Babacz, CAN:119: 228090
-
US 5 234 723 (1990), Polar Materials Inc. (Martins Creek, PA), inv. R. J. Babacz, CAN:119: 228090.
-
-
-
-
11
-
-
33748604315
-
-
B. Borer, A. Sonnenfeld, Ph. Rudolf von Rohr, Surf. Coat. Technol. 2006, 201, 1757.
-
(2006)
Surf. Coat. Technol
, vol.201
, pp. 1757
-
-
Borer, B.1
Sonnenfeld, A.2
Rudolf von Rohr, P.3
-
13
-
-
56949095893
-
-
A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Appl. Surf. Sci. 2008, 255, 1911.
-
(2008)
Appl. Surf. Sci
, vol.255
, pp. 1911
-
-
Spillmann, A.1
Sonnenfeld, A.2
Rudolf von Rohr, P.3
-
14
-
-
60049098464
-
-
A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Plasma Process. Polym. 2008, 5, 753.
-
A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Plasma Process. Polym. 2008, 5, 753.
-
-
-
-
15
-
-
67651216601
-
-
Garmisch-Patenkirchen, Germany, submitted to Plasma Process. Polym
-
Ch. Roth, A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Proc. 11th Int. Conf. Plasma Surf. Eng., PSE2008, Garmisch-Patenkirchen, Germany, submitted to Plasma Process. Polym.
-
Proc. 11th Int. Conf. Plasma Surf. Eng., PSE2008
-
-
Roth, C.1
Spillmann, A.2
Sonnenfeld, A.3
Rudolf von Rohr, P.4
-
16
-
-
0035797580
-
-
H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, R. Hippler, Vacuum 2001, 63, 385.
-
(2001)
Vacuum
, vol.63
, pp. 385
-
-
Kersten, H.1
Deutsch, H.2
Steffen, H.3
Kroesen, G.M.W.4
Hippler, R.5
-
17
-
-
27944475980
-
-
C. Arpagaus, A. Rossi, Ph. Rudolf von Rohr, Appl. Surf. Sci. 2005, 252, 1581.
-
(2005)
Appl. Surf. Sci
, vol.252
, pp. 1581
-
-
Arpagaus, C.1
Rossi, A.2
Rudolf von Rohr, P.3
-
18
-
-
24644442202
-
-
C. Arpagaus, A. Rossi, Ph. Rudolf von Rohr, Surf. Coat. Technol. 2005, 200, 525.
-
(2005)
Surf. Coat. Technol
, vol.200
, pp. 525
-
-
Arpagaus, C.1
Rossi, A.2
Rudolf von Rohr, P.3
-
25
-
-
33646499693
-
-
A. Sonnenfeld, R. Hauert, Ph. Rudolf von Rohr, Plasma Chem. Plasma Process. 2006, 26, 319.
-
(2006)
Plasma Chem. Plasma Process
, vol.26
, pp. 319
-
-
Sonnenfeld, A.1
Hauert, R.2
Rudolf von Rohr, P.3
-
26
-
-
0035782988
-
-
A. Sonnenfeld, T. M. Tun, L. Zajícková, K. V. Kozlov, H.-E. Wagner, J. F. Behnke, R. Hippler, Plasmas Polym. 2001, 6, 237.
-
(2001)
Plasmas Polym
, vol.6
, pp. 237
-
-
Sonnenfeld, A.1
Tun, T.M.2
Zajícková, L.3
Kozlov, K.V.4
Wagner, H.-E.5
Behnke, J.F.6
Hippler, R.7
-
27
-
-
67651242647
-
-
High Pressure Low Temp. Plasma Chem, Greifswald, Germany
-
A. Sonnenfeld, K. V. Kozlov, J. F. Behnke, Proc. HAKONE VII, 7th Int. Symp. High Pressure Low Temp. Plasma Chem., Greifswald, Germany 2000, p. 247.
-
(2000)
Proc. HAKONE VII, 7th Int. Symp
, pp. 247
-
-
Sonnenfeld, A.1
Kozlov, K.V.2
Behnke, J.F.3
-
28
-
-
0343712279
-
Technological impacts of dusty plasmas
-
André Bouchoule, Ed, Wiley, Chichester
-
A. Bouchoule, "Technological impacts of dusty plasmas", in: Dusty plasmas, André Bouchoule, Ed., Wiley, Chichester 1999.
-
(1999)
Dusty plasmas
-
-
Bouchoule, A.1
-
29
-
-
2142766682
-
-
H. Kersten, H. Deutsch, G. M. W. Kroesen, Int. J. Mass Spectrom. 2004, 233, 51.
-
(2004)
Int. J. Mass Spectrom
, vol.233
, pp. 51
-
-
Kersten, H.1
Deutsch, H.2
Kroesen, G.M.W.3
-
31
-
-
0003903459
-
-
Institute of Physics Publishing, Bristol/Philadelphia
-
J. R. Roth, "Industrial Plasma Engineering", Vol. 1, Institute of Physics Publishing, Bristol/Philadelphia 1995.
-
(1995)
Industrial Plasma Engineering
, vol.1
-
-
Roth, J.R.1
-
32
-
-
0034766712
-
-
S. H. Jung, S. H. Park, D. H. Lee, S. D. Kim, Polym. Bull. 2001, 47, 199.
-
(2001)
Polym. Bull
, vol.47
, pp. 199
-
-
Jung, S.H.1
Park, S.H.2
Lee, D.H.3
Kim, S.D.4
-
33
-
-
67651237260
-
-
WO2007/036060 A1 (2005), ETH Zurich (Switzerland), invs. A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, CAN: 149:479546.
-
WO2007/036060 A1 (2005), ETH Zurich (Switzerland), invs. A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, CAN: 149:479546.
-
-
-
-
34
-
-
56949108527
-
-
A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Plasma Process. Polym. 2007, 4, 16.
-
A. Spillmann, A. Sonnenfeld, Ph. Rudolf von Rohr, Plasma Process. Polym. 2007, 4, 16.
-
-
-
-
35
-
-
67651231240
-
-
Diploma Thesis, ETH Zurich
-
P. Reichen, Diploma Thesis, ETH Zurich 2005.
-
(2005)
-
-
Reichen, P.1
|