Effect of acid, water and alcohol ratios on sol-gel preparation of antireflective amorphous SiO2 coatings

Journal of Non-Crystalline Solids

Volumn 357, Issue 16-17, 2011, Pages 3130-3135

  Kesmez, Ömer ^a,b   Burunkaya, Esin ^a,b   Kiraz, Nadir ^a,b   Çamurlu, H Erdem ^a,c   Asiltürk, Meltem ^d   Arpaç, Ertuǧrul ^a,b  

^a AKDENIZ UNIVERSITY   (Turkey)

^b NANOen RandD Ltd   (Turkey)

^c Mattek Advanced Materials Ltd   (Turkey)

^d INONU UNIVERSITY   (Turkey)

Author keywords

Acid catalysis; Antireflective film; Nanometric film; Nanometric SiO2 particle; Sol gel processes

Indexed keywords

ACID CATALYSIS; ACID CATALYST; AFM; ANTIREFLECTIVE; ANTIREFLECTIVE FILMS; DIP COATING; FTIR ANALYSIS; GLASS SUBSTRATES; HYDROLYSIS AND CONDENSATION; LIGHT TRANSMITTANCE; NANOMETRICS; ONE STEP; SOL GEL PREPARATIONS; TETRA-ETHYL-ORTHO-SILICATE; WATER AMOUNT;

CATALYSIS; COAGULATION; COATINGS; CONDENSATION REACTIONS; ETHANOL; FILM PREPARATION; GELATION; GELS; HYDROLYSIS; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; SUBSTRATES;

NITRIC ACID;

EID: 79959762484     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.05.003     Document Type: Article

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