Preparation of antireflective SiO2 nanometric films

Ceramics International

Volumn 36, Issue 1, 2010, Pages 391-394

  Kesmez, Ömer ^a,b   Erdem Camurlu H ^a   Burunkaya, Esin ^a,b   Arpaç, Ertuǧrul ^a,b  

^a AKDENIZ UNIVERSITY   (Turkey)

^b NANOen RandD Ltd   (Turkey)

Author keywords

A. Sol gel processes; C. Optical properties; D. SiO2; Nanometric film

Indexed keywords

A. SOL-GEL PROCESSES; AFM; ANTIREFLECTIVE; AVERAGE PARTICLE SIZE; BAKING TEMPERATURE; C. OPTICAL PROPERTIES; D. SIO2; DIP COATING; GLASS SUBSTRATES; GLASS SURFACES; LIGHT TRANSMITTANCE; NANOMETRIC FILM; NANOMETRICS; SEM OBSERVATION;

COATINGS; GELATION; GELS; GLASS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SINTERING; SOL-GEL PROCESS; SOL-GELS; SOLS;

SILICON COMPOUNDS;

EID: 70350732815     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2009.07.030     Document Type: Article

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