Atomistic insights into aqueous corrosion of copper

Journal of Chemical Physics

Volumn 134, Issue 23, 2011, Pages

  Jeon, Byoungseon ^a   Sankaranarayanan, Subramanian K R S ^b   Van Duin, Adri C T ^c   Ramanathan, Shriram ^a  

^a HARVARD UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS CONDITION; AQUEOUS CORROSION; AQUEOUS MEDIA; ATOMIC SCALE; ATOMIC TRAJECTORIES; ATOMIC-SCALE MECHANISMS; BASIC MECHANISM; BOND BREAKAGE; BOND FORMATION; CHARGED STATE; CHLORIDE IONS; CHLORINE CONCENTRATION; COPPER SUBSTRATES; CORROSION PROCESS; CU SURFACES; DYNAMICAL CORRELATION FUNCTIONS; FUNDAMENTAL PROBLEM; HALIDE IONS; HYDROXIDE IONS; ION DENSITY; METAL DISSOLUTION; MOLECULAR DYNAMICS SIMULATIONS; PARTIAL FRACTIONS; SYSTEMATIC INVESTIGATIONS;

ADSORPTION; ATOMS; CHLORINE; CHLORINE COMPOUNDS; COPPER; COPPER CORROSION; CORROSION RESISTANCE; DISSOLUTION; IONS; METAL HALIDES; MOLECULAR DYNAMICS; PROTONS; TOXICITY;

CORROSION RATE;

EID: 79959747677     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3599090     Document Type: Article

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