Copper repassivation characteristics in carbonate-based solutions

Journal of the Electrochemical Society

Volumn 153, Issue 9, 2006, Pages

  Abelev, Esta ^a,c   Smith, Andrew Jonathan ^b   Hassel, Achim Walter ^b,c   Ein Eli, Yair ^a,c  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^c ELECTROCHEMICAL SOCIETY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONATE-BASED SOLUTIONS; COPPER PASSIVE FILMS; COPPER REPASSIVATION; MECHANICAL DAMAGES; SLURRYJET SYSTEM;

CARBONATES; CONCENTRATION (PROCESS); CONDUCTIVE FILMS; COPPER; NEGATIVE IONS; PASSIVATION;

SOLUTIONS;

EID: 33750118192     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2213547     Document Type: Article

References (38)

1. J. M. Steigerwald, S. P. Murarka, and R. J. Gutmann, Chemical Mechanical Planarizatian of Microelectronic Materials, Wiley, New York (1997).
2. S. Lakshminarayanan, J. Steigerwald, D. T. Price, M. Bourgeois, T. P. Chow, R. J. Gutmann, and S. P. Murarka, IEEE Electron Device Lett., 15, 307 (1994).
3. M. B. Small and D. J. Pearson, IBM J. Res. Dev., 34, 858 (1990).
4. P. Singer, Semicond. Int., 21, 90 (1998).
5. R. Lui, Solid-State Electron., 43, 1003 (1999).
6. Y. Ein-Eli, E. Abelev, E. Rabkin, and D. Starosvetsky, J. Electrochem. Soc., 150, C646 (2003).
7. E. Paul, F. Kaufman, V. Brusic, J. Zhang, F. Sun, and R. Vacassy, J. Electrochem. Soc., 152, G322 (2005).
8. Z. Li, K. Ina, P. Lefevre, I. Koshiyama, and A. Philipossian, J. Electrochem. Soc., 152, G299 (2005).
9. Y. Ein-Eli, E. Abelev, and D. Starosvetsky, Electrochim. Acta, 49, 1499 (2004).
10. R. K. Singh, S. M. Lee, K. S. Choi, G. B. Basim, W. Choi, Z. Chen, and B. M. Moudgil, MRS Bull., 27, 752 (2002).
11. S. Aksu, L. Wang, and F. M. Doyle, J. Electrochem. Soc., 150, G718 (2003).
12. Y. Ein-Eli, E. Abelev, and D. Starosvetsky, J. Electrochem. Soc., 151, G236 (2004).
13. G. B. Shinn, V. Korthuis, and A. M. Wilson, Handbook of Semiconductor Manufacturing Technology, p. 415, Marcel Dekker, New York (2000).
14. F. B. Kaufman, D. B. Thompson, and R. E. Broadie, J. Electrochem. Soc., 138, 3460 (1991).
15. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, 2nd ed., NACE, Houston, TX (1974).
16. V. Maurice, H. H. Strehblow, and P. Marcus, Surf. Sci., 458, 185 (2000).
17. S. M. Wilhelm, Y. Tanizawa, C. Lin, and N. Hackerman, Corros. Sci., 22, 791 (1982).
18. D. D. Maodonald, J. Electrochem. Soc., 121, 208 (1966).
19. W. Kautek and J. G. Gordon, J. Electrochem. Soc., 137, 2672 (1990).
20. H. H. Strehblow and B. Titze, Electrochim. Acta, 25, 839 (1980).
21. D. Tromans and R. Sun, J. Electrochem. Soc., 139, 1945 (1992).
22. H. Y. H. Chan, C. G. Takoudis, and M. J. Weaver, J. Phys. Chem. B, 103, 357 (1999).
23. R. L. Deutscher and R. Woods, J. Appl. Electrochem., 16, 413 (1986).
24. J. Ambrose, R. J. Barradas, and D. W. Shoesmith, J. Electroanal. Chem. Interfacial Electrochem., 47, 47 (1973).
25. J. Ambrose, R. J. Barradas, and D. W. Shoesmith, J. Electroanal. Chem. Interfacial Electrochem., 47, 65 (1973).
26. J. W. Schultze and A. W. Hassel, in Encyclopedia of Electrochemistry, A. J. Bard and M. Stratmann, Vol. 4, Corrosion and Oxide Films, M. Stratmann and G. S. Frankel, Volume Editors, pp. S. 216-270;
27. Encyclopedia of Electrochemistry, A. J. Bard and M. Stratmann, Vol. 4, Corrosion and Oxide Films, M. Stratmann and G. S. Frankel, Volume Editors, 188-189, Wiley-VCH Weinheim (2003).
28. I. T. E. Fonseca, A. C. S. Marin, and A. C. Sa, Electrochim. Acta, 37, 2541 (1993).
29. T. Hurlen, G. Ottesen, and A. Staurset, Electrochim. Acta, 23, 39 (1978).
30. T. Milošev, M. Metikos-Hukovic, M. Drogowska, H. Menard, and L. Brossard, J. Electrochem. Soc., 139, 2409 (1992).
31. R. M. Souto, S. Gonzalez, R. C. Salvarezza, and A. J. Arvia, Electrochim. Acta, 39, 2619 (1994).
32. Y. Ein-Eli, E. Abelev, M. Auinat, and D. Starosvetsky, Electrochem. Solid-State Lett., 8, B69 (2005).
33. M. Perez-Sanchez, R. M. Souto, M. Barrera, S. Gonzalez, R. C. Salvarezza, and A. J. Arvia, Electrochim. Acta. 38, 703 (1993).
34. E. Mattsson and A. M. Fredriksson, Dr. Corros. J., London, 3, 246 (1968).
35. J. N. Thomas and A. K. Tiller, Br. Corros. J., London, 7, 257 (1972).
36. A. W. Hassel and A. J. Smith. Corros. Sci., In press.
37. E. Akiyama, A. W. Hassel, and M. Stratmann, J. Phys. D, Accepted for publication.
38. Y. Ein-Eli and E. Abelev, Unpublished results.