메뉴 건너뛰기




Volumn 2, Issue 2, 2009, Pages 699-709

Optimization of the adhesion strength of Arc ion plating TiALN films by the taguchi method

Author keywords

Adhesion strength; Arc ion plating; Taguchi method; TiAlN

Indexed keywords

ARC ION PLATING; COMPETITIVE GROWTH; NEGATIVE BIAS; NITROGEN PRESSURE; PRE-TREATMENT; SUBSTRATE TEMPERATURE; TIALN; WORKING PRESSURES;

EID: 79959600763     PISSN: None     EISSN: 19961944     Source Type: Journal    
DOI: 10.3390/ma2020699     Document Type: Article
Times cited : (20)

References (16)
  • 1
    • 0030387529 scopus 로고    scopus 로고
    • A study on the surface structure of Ti cathode and the macroparticle of TiN films prepared by the arc ion plating process
    • Kang, G.H.; Uchida, H.; Hoh, E.S. A study on the surface structure of Ti cathode and the macroparticle of TiN films prepared by the arc ion plating process. Surf. Coat. Technol. 1996, 86-87, 421-424.
    • (1996) Surf. Coat. Technol. , vol.86-87 , pp. 421-424
    • Kang, G.H.1    Uchida, H.2    Hoh, E.S.3
  • 2
    • 50749134312 scopus 로고
    • Microstructural investigation of droplets in arcevaporated TiN films
    • Ljungcrantz, H.; Hultman, L.; Sundgren, J.E. Microstructural investigation of droplets in arcevaporated TiN films. Surf. Coat. Technol. 1994, 63, 123-128.
    • (1994) Surf. Coat. Technol. , vol.63 , pp. 123-128
    • Ljungcrantz, H.1    Hultman, L.2    Sundgren, J.E.3
  • 3
    • 0025701305 scopus 로고
    • Reduction in macroparticles during the deposition of TiN films prepared by arc ion plating
    • Akari, K.; Tamagaki, H.; Kumakiri, T.; Tsuji, K.; Koh, E.S.; Tai, C.N. Reduction in macroparticles during the deposition of TiN films prepared by arc ion plating. Surf. Coat. Technol. 1990, 43-44, 312-323.
    • (1990) Surf. Coat. Technol. , vol.43-44 , pp. 312-323
    • Akari, K.1    Tamagaki, H.2    Kumakiri, T.3    Tsuji, K.4    Koh, E.S.5    Tai, C.N.6
  • 4
    • 0037472523 scopus 로고    scopus 로고
    • Performance evaluation of AIP-TiAlN coated tool for high speed machining
    • Kang, M.C.; Park, I.W.; Kim, K.H. Performance evaluation of AIP-TiAlN coated tool for high speed machining. Surf. Coat. Technol. 2003, 163-164, 734-738.
    • (2003) Surf. Coat. Technol. , vol.163-164 , pp. 734-738
    • Kang, M.C.1    Park, I.W.2    Kim, K.H.3
  • 5
    • 0037147092 scopus 로고    scopus 로고
    • Comparison for mechanical properties between TiN and TiAlN coating layers by AIP technique
    • Yoon, S.Y.; Lee, K.O; Kang, S.S.; Kim, K.H. Comparison for mechanical properties between TiN and TiAlN coating layers by AIP technique. J. Mater. Process. Technol. 2002, 130-131, 260-265.
    • (2002) J. Mater. Process. Technol. , vol.130-131 , pp. 260-265
    • Yoon, S.Y.1    Lee, K.O.2    Kang, S.S.3    Kim, K.H.4
  • 6
    • 36749094475 scopus 로고    scopus 로고
    • Optimization of wear-corrosion properties of a-C: N films using filtered cathodic arc deposition
    • Tan, A.H.; Cheng, Y.C. Optimization of wear-corrosion properties of a-C: N films using filtered cathodic arc deposition. Diam. Relat. Mater. 2008, 17, 36-42.
    • (2008) Diam. Relat. Mater. , vol.17 , pp. 36-42
    • Tan, A.H.1    Cheng, Y.C.2
  • 7
    • 42749086372 scopus 로고    scopus 로고
    • Taguchi optimization of device parameters for fullerene and Poly (3-octylthiophene) based heterojunction photovoltaic devices
    • Kalita, G.; Adhikari, S.; Aryal, H.R.; Somani, P.R.; Somani, S.P.; Sharon, M.; Umeno, M. Taguchi optimization of device parameters for fullerene and Poly (3-octylthiophene) based heterojunction photovoltaic devices. Diam. Relat. Mater. 2008, 17, 799-803.
    • (2008) Diam. Relat. Mater. , vol.17 , pp. 799-803
    • Kalita, G.1    Adhikari, S.2    Aryal, H.R.3    Somani, P.R.4    Somani, S.P.5    Sharon, M.6    Umeno, M.7
  • 8
    • 28044466697 scopus 로고    scopus 로고
    • Optimization of field emission properties of carbon nanotubes by Taguchi method
    • Ting, J.H.; Chang, C.C.; Chen, S.L.; Lu, D.S.; Kung, C.Y.; Huang, F.Y. Optimization of field emission properties of carbon nanotubes by Taguchi method. Thin Solid Films 2006, 496, 299-305.
    • (2006) Thin Solid Films , vol.496 , pp. 299-305
    • Ting, J.H.1    Chang, C.C.2    Chen, S.L.3    Lu, D.S.4    Kung, C.Y.5    Huang, F.Y.6
  • 9
    • 0031245551 scopus 로고    scopus 로고
    • Deposition of (Ti Al) N thin films by organometallic chemical vapor deposition: thermodynarnic predictions and experimental results
    • Gilles, S.; Bourhila, N.; Ikeda, S.; Bernard, C.; Madar, R. Deposition of (Ti, Al) N thin films by organometallic chemical vapor deposition: thermodynarnic predictions and experimental results. Surf. Coat. Thech. 1997, 94-95, 285-290.
    • (1997) Surf. Coat. Thech. , vol.94-95 , pp. 285-290
    • Gilles, S.1    Bourhila, N.2    Ikeda, S.3    Bernard, C.4    Madar, R.5
  • 10
    • 0023450182 scopus 로고
    • The relationship between hardness and scratch adhession
    • Burnett, P.J.; Rickerby, D.S. The relationship between hardness and scratch adhession. Thin Solid Films 1987, 154, 403-416.
    • (1987) Thin Solid Films , vol.154 , pp. 403-416
    • Burnett, P.J.1    Rickerby, D.S.2
  • 11
    • 0032670554 scopus 로고    scopus 로고
    • Graded Al-AlN, TiN, and TiAlN multilayers deposited by radio-frequency reactive magnetron sputtering
    • Raveh, A.; Weiss, M.; Pinkas, M.; Rosen, D.Z.; Kimmel, G. Graded Al-AlN, TiN, and TiAlN multilayers deposited by radio-frequency reactive magnetron sputtering. Surf. Coat. Thech. 1999, 114, 269-277.
    • (1999) Surf. Coat. Thech. , vol.114 , pp. 269-277
    • Raveh, A.1    Weiss, M.2    Pinkas, M.3    Rosen, D.Z.4    Kimmel, G.5
  • 12
    • 0033502684 scopus 로고    scopus 로고
    • Improvement of the interfacial integrity of (Ti Al)N hard coatings deposited on high speed steel cutting tools. Surf. Coat. Thech
    • Wang, D.Y.; Chang, C.L.; Wong, K.W.; Li, Y.W.; Ho, W.Y. Improvement of the interfacial integrity of (Ti,Al)N hard coatings deposited on high speed steel cutting tools. Surf. Coat. Thech. 1999, 120-121, 388-394.
    • (1999) , vol.120-121 , pp. 388-394
    • Wang, D.Y.1    Chang, C.L.2    Wong, K.W.3    Li, Y.W.4    Ho, W.Y.5
  • 13
    • 50849099783 scopus 로고    scopus 로고
    • Influence of N2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system
    • Wang, Q.; Park, I.W.; Kim, K.H. Influence of N2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system. J. Vac. Sci. Technol. A 2008, 26, 1188-1194.
    • (2008) J. Vac. Sci. Technol. A , vol.26 , pp. 1188-1194
    • Wang, Q.1    Park, I.W.2    Kim, K.H.3
  • 14
    • 0037461180 scopus 로고    scopus 로고
    • Effects of nitrogen partial pressure and pulse bias voltage on (Ti Al) N coatings by arc ion plating
    • Li, M.; Wang, F. Effects of nitrogen partial pressure and pulse bias voltage on (Ti, Al) N coatings by arc ion plating. Surf. Coat. Technol. 2003, 167, 197-202.
    • (2003) Surf. Coat. Technol. , vol.167 , pp. 197-202
    • Li, M.1    Wang, F.2
  • 15
    • 46749147484 scopus 로고    scopus 로고
    • Deposition of thick TiAlN coatings on 2024 Al/SiCp substrate by Arc ion plating
    • Zhao, S.S.; Du, H.; Zheng, J.D.; Yang, Y.; Wang, W.; Gong, J.; Sun, C. Deposition of thick TiAlN coatings on 2024 Al/SiCp substrate by Arc ion plating. Surf. Coat. Technol. 2008, 202, 5170-5174.
    • (2008) Surf. Coat. Technol. , vol.202 , pp. 5170-5174
    • Zhao, S.S.1    Du, H.2    Zheng, J.D.3    Yang, Y.4    Wang, W.5    Gong, J.6    Sun, C.7
  • 16
    • 39549119977 scopus 로고    scopus 로고
    • Deposition of TiSiN coatings by arc ion plating process
    • Guo, C.T.; Lee, D.; Chen, P.C. Deposition of TiSiN coatings by arc ion plating process. Appl. Surf. Sci. 2008, 254, 3130-3136.
    • (2008) Appl. Surf. Sci. , vol.254 , pp. 3130-3136
    • Guo, C.T.1    Lee, D.2    Chen, P.C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.