Potential-dependent surface morphology and microtexture evolution of electrodeposited copper films

Electrochemical and Solid-State Letters

Volumn 14, Issue 7, 2011, Pages

  Lafouresse, M C ^a   Fukunaka, Y ^b,c   Homma, T ^b   Honjo, S ^d   Kikuchi, S ^d   Schwarzacher, W ^e  

^a KYOTO UNIVERSITY   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^d UNIVERSITY OF SHIGA PREFECTURE   (Japan)

^e UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER FILMS; CRYSTALLOGRAPHIC ORIENTATIONS; ELECTRODEPOSITED COPPER; ELECTRON BACKSCATTERING DIFFRACTION; FIBRE TEXTURE; LIMITING CURRENT DENSITY; MICRO-TEXTURE; OVER POTENTIAL; POTENTIAL-DEPENDENT; SULPHATES;

COPPER METALLOGRAPHY; ELECTRODEPOSITION; MORPHOLOGY;

METALLIC FILMS;

EID: 79959543091     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3578016     Document Type: Article

References (15)

1. P. C. Andricacos, Electrochem. Soc. Interface, 8 (1), 32 (1999).
2. N. D. Nikoli, K. I. Popov, Lj. J. Pavlovi, and M. G. Pavlovi, Surf. Coat. Technol., 201, 560 (2006). 10.1016/j.surfcoat.2005.12.004 (Pubitemid 44340757)
3. St. Rashkov, D. S. Stoichev, and I. Tomov, Electrochim. Acta, 17, 1955 (1972). 10.1016/0013-4686(72)80020-3
4. X. Ye, M. De Bonte, J. P. Celis, and J. R. Roos, J. Electrochem. Soc., 139, 1592 (1992). 10.1149/1.2069461
5. Y. Fukunaka, H. Doi, and Y. Kondo, J. Electrochem. Soc., 137, 88 (1990). 10.1149/1.2086445
6. O. Engler, and V. Randle, Introduction to Texture Analysis, Taylor and Francis Group, Boca Raton (2010).
7. G -T. Lui, D. Chen, and J -C. Kuo, J. Phys. D: Appl. Phys., 42, 215410 (2009). 10.1088/0022-3727/42/21/215410
8. W. Shao and G. Zangari, J. Phys. Chem. C, 113, 10097 (2009). 10.1021/jp8095456
9. R. Blonde, H.-L. Chan, N. Allain-Bonasso, B. Bolle, T. Grosdidier, and J. Lu, J. Alloys Compd., 504S, S410 (2010). 10.1016/j.jallcom.2010.04.040
10. N. Imaz, E. Garca-Lecina, C. Surez, J. A. Dez, J. Rodrguez, J. Molina, and V. Garca-Navas, Trans. Inst. Met. Finish., 87, 64 (2009). 10.1179/174591909X424807
11. M. C. Lafouresse, Y. Fukunaka, T. Matsuoka, and W. Schwarzacher, Electrochim. Acta, Accepted. 10.1179/174591909X424807
12. M. C. Lafouresse, P. J. Heard, and W. Schwarzacher, Phys. Rev. Lett., 98, 236101 (2007). 10.1103/PhysRevLett.98.236101 (Pubitemid 47139817)
13. G. I. Finch and C. H. Sun, Trans. Faraday Soc., 32, 852 (1936). 10.1039/tf9363200852
14. J. Amblard, I. Epelboin, M. Froment, and G. Maurin, J. Appl. Electrochem., 9, 233 (1979). 10.1007/BF00616093
15. J. W. Steeds, A. E. Mora, J. E. Butler, and K. M. Bussmann, Philos. Mag. A, 82, 1741 (2002).