New DRIE Process with Sidewall Protection Layer Formed by O2 Plasma Irradiation

IEEJ Transactions on Sensors and Micromachines

Volumn 123, Issue 12, 2003, Pages 541-547

  Ohara, Junji ^a   Kano, Kazuhiko ^a   Takeuchi, Yukihiro ^a  

^a DENSO CORPORATION   (Japan)

Author keywords

Aspect ratio; DRIE; O2 plasma; SiO2 layer

Indexed keywords

EID: 79959408554     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.123.541     Document Type: Article

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