Phase transition of TiO2 thin films detected by the pulsed laser photoacoustic technique

Applied Physics A: Materials Science and Processing

Volumn 102, Issue 3, 2011, Pages 699-704

  Perez Pacheco A ^a   Castaneda Guzman R ^a   De Oca, C Oliva Montes ^a   Esparza Garcia A ^a   Ruiz, S J Pérez ^a  

^a Universidad Nacional Autónoma de México   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; AMORPHOUS STATE; CONTROLLED TEMPERATURE; CORRELATION ANALYSIS; CRYSTALLINE STATE; DETECTION STAGE; ENHANCED SENSITIVITY; FLUENCES; NON-DESTRUCTIVE TECHNIQUE; PHOTOACOUSTIC MEASUREMENTS; PHOTOACOUSTIC SIGNALS; PHOTOACOUSTIC TECHNIQUES; ROOM TEMPERATURE; SPECTROSCOPY MEASUREMENTS; SPUTTERING TECHNIQUES; TEMPERATURE VARIATION; THIN FILM MORPHOLOGY; TIO; TITANIUM OXIDE THIN FILMS;

ABLATION; AMORPHOUS FILMS; CRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

PHASE TRANSITIONS;

EID: 79959361962     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-010-5961-0     Document Type: Article

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