Rigorous FEM-simulation of EUV-masks: Influence of shape and material parameters

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Pomplun, Jan ^a,b,c   Burger, Sven ^a,b,c   Schmidt, Frank ^a,b,c   Zschiedrich, Lin ^a,b,c   Scholze, Frank ^d   Laubis, Christian ^d   Dersch, Uwe ^e  

^a ZUSE INSTITUTE BERLIN   (Germany)

^b Deutsche Forschungsgemeinschaft   (Germany)

^c JCMWAVE GMBH   (Germany)

^d PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^e Advanced Mask Technology Centre GmbH and Co KG   (Germany)

Author keywords

EUV; FEM; Mask; Photolithography; Simulation

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; FINITE ELEMENT METHOD; PHOTOLITHOGRAPHY;

DIFFRACTION PATTERN; GEOMETRICAL PARAMETERS; MASK FABRICATION; SCATTEROMETRY MEASUREMENTS;

MASKS;

EID: 33846598048     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686828     Document Type: Conference Paper

References (13)

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