Surface damage on diamond membranes fabricated by ion implantation and lift-off

Applied Physics Letters

Volumn 98, Issue 23, 2011, Pages

  Drumm, V S ^a   Alves, A D C ^a   Fairchild, B A ^a   Ganesan, K ^a   McCallum, J C ^a   Jamieson, D N ^a   Prawer, S ^a   Rubanov, S ^b   Kalish, R ^c   Feldman, L C ^d,e  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

^c TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^d VANDERBILT UNIVERSITY   (United States)

^e RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFTER HIGH TEMPERATURE; CHEMICAL ETCHING; CHEMICAL INERTNESS; DIAMOND MEMBRANES; ESSENTIAL ELEMENTS; GRAZING ANGLES; HYDROGEN PLASMA EXPOSURES; ION BEAM PROCESSING; PHOTONIC STRUCTURE; PHOTONIC SYSTEMS; SACRIFICIAL LAYER; SURFACE DAMAGES; SURFACE-SENSITIVE TECHNIQUE; THIN LAYERS; THIN MEMBRANE;

GRAPHITE; ION IMPLANTATION; IONS; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

DIAMONDS;

EID: 79959327650     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3597223     Document Type: Article

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