Late-news poster: Direct patterning of metal electrodes for tft-lcd fabrication

Digest of Technical Papers - SID International Symposium

Volumn 40, Issue 1, 2009, Pages 1348-1350

  Moon, Tae Hyoung ^a   Nam, Seong Hee ^a   Kim, Nam Kook ^a   Kook, Yun Ho ^a   Jung, Young Ki ^a   Chang, Youn Gyoung ^a   Yoo, Soon Sung ^a   Kim, Chang Dong ^a   Kang, Inbyeong ^a   Chung, In Jae ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; AUTOMOBILE MANUFACTURE; BINARY ALLOYS; ELECTRODES; FABRICATION; NEODYMIUM ALLOYS; REFRACTORY METAL COMPOUNDS; SILVER;

DIRECT PRINTING; DIRECT-PATTERNING; GATE ELECTRODES; LINE RESISTIVITY; METAL ELECTRODES; PRINTING TECHNOLOGIES; SILVER METAL; TRANSFER CHARACTERISTICS;

THIN FILM TRANSISTORS;

EID: 79959254147     PISSN: 0097966X     EISSN: 21680159     Source Type: Conference Proceeding    
DOI: 10.1889/1.3256550     Document Type: Conference Paper

References (10)

1. S. S. Yoo, et al., “The fabrication of TFTs for LCD using the 3mask process,” IMID 05, 948-951, (2005).
2. C. H. Kim, I.H. Song, M.K. Han, “A New High Performance Poly-Si TFT by Simple Excimer Laser Annealing on Selectively Floating a-Si Layer,” IEDM 01, 751-754, (2001).
3. Yoshiro Mikami, et al., “A New Patterning Process Concept for Large-Area Transistor Circuit Fabrication,” IEEE Trans. Electron Dev. 41, 306-314, (1994).
4. Tomihisa Sunata, et al., “A 640×440 Pixel Active-Matrix LCD Using a-Si TFT’s,” IEEE Trans. Electron Dev. 33, 1218-1221, (1986).
5. S. H. Nam, et al., “Enhancement of roll printing accuracy for TFT-LCD,” SID 08, 43.4, (2008).
6. Y. G. Chang, et al., “Design parameters of Roll Printing Process for TFT-LCD Fabrication,” SID 08, 43.1, (2008).
7. Dongjo Kim, et al., “Highly Conductive Ink Jet Printed Films of Nanosilver Particles for Printable Electronics,” Electrochem. Solid State Lett. 8, J30-J33, (2005).
8. Xiuyu Wang, et al., “Nano-silver paste with low roasting temperature,” 2005 6th International Conference on Electronic Packaging Technology.
9. C.O. JEONG, et al., “Feasibility of an Ag-Alloy Film as a Thin-Film Transistor Liquid-Crystal Display Source/Drain Material,” J. Electro. Mat. 31, 610-614, (2002).
10. Jaegab Lee, et al., “Adhesion, passivation, and resistivity of a Ag(Mg) gate electrode for an amorphous silicon thin-film transistor,” J. Mat. Res. 18, 1441-1446, (2003).