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Volumn 7638, Issue , 2010, Pages

Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements

Author keywords

aerial image measurements; dose correction; DRAM; Intra Field CDU; reticle CDU; reticle qualification; rotated brick wall

Indexed keywords

AERIAL IMAGE MEASUREMENT; DOSE CORRECTION; INTRA-FIELD CDU; RETICLE CDU; RETICLE QUALIFICATION; ROTATED BRICK WALL;

EID: 79958061562     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848053     Document Type: Conference Paper
Times cited : (3)

References (4)
  • 2
    • 66649094765 scopus 로고    scopus 로고
    • WLCD: A new System for Wafer Level CD Metrology on Photomasks
    • Sven Martin, Holger Seitz, Wolfgang Degel, Ute Buttgereit, Thomas Scherübl, "WLCD: A new System for Wafer Level CD Metrology on Photomasks", Proc. SPIE, Volume 7272 (2009), pp. 72722T-72722T-9 (2009).
    • (2009) Proc. SPIE , vol.7272 , Issue.2009
    • Martin, S.1    Seitz, H.2    Degel, W.3    Buttgereit, U.4    Scherübl, T.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.