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Volumn 22, Issue 6, 2011, Pages 666-671

Structure and electrical properties of CuAlO 2 thin films derived by sol-gel processing

Author keywords

[No Author keywords available]

Indexed keywords

AFTER-HEAT TREATMENT; ANNEALING TEMPERATURES; ARGON GAS; ATOMIC RATIO; ION CONCENTRATIONS; QUARTZ GLASS SUBSTRATES; ROOM-TEMPERATURE RESISTIVITY; SOL-GEL PROCESSING; SPIN-COATING METHOD;

EID: 79958854303     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-010-0193-9     Document Type: Article
Times cited : (7)

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  • 3
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    • 2
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    • Neumann-Spallart, M.1    Pai, S.P.2    Pinto, R.3
  • 6
    • 23944525867 scopus 로고    scopus 로고
    • The influence of Cu/Al ratio on properties of chemical-vapor-deposition- grown p -type Cu-Al-O transparent semiconducting films
    • DOI 10.1063/1.1997293, 033707
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  • 10
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    • Dong, G.1    Zhang, M.2    Lan, W.3    Dong, P.4    Yan, H.5
  • 13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.