Annealing effect on the structural, optical, and electrical properties of CuAlO2 films deposited by magnetron sputtering

Journal of Materials Science

Volumn 44, Issue 6, 2009, Pages 1594-1599

  Lan, W ^a,b   Cao, W L ^a   Zhang, M ^b   Liu, X Q ^a   Wang, Y Y ^a   Xie, E Q ^a   Yan, H ^b  

^a LANZHOU UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DIFFRACTION; ELECTRIC PROPERTIES; HOLOGRAPHIC INTERFEROMETRY; OXYGEN;

ANNEALED FILMS; ANNEALING EFFECTS; ANNEALING TEMPERATURES; CRYSTALLINITY; DIRECT TRANSITIONS; ELECTRICAL PROPERTIES; ENERGY BANDS; ENERGY REGIONS; INTERSTITIAL OXYGENS; INTRINSIC DEFECTS; OPTICAL ABSORPTION EDGES; OPTICAL BAND-GAPS; SCATTERING SIGNALS; THREE ORDERS OF MAGNITUDES; X-RAY DIFFRACTION PATTERNS;

ANNEALING;

EID: 62649172148     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-008-3229-2     Document Type: Conference Paper

References (25)

1. H Kawazoe M Yasukawa H Hyodo M Kurita H Yanagi H Hosono 1997 Nature 389 939
2. H Yanagi S Inoue K Ueda H Kawazoe H Hosono N Hamada 2000 J Appl Phys 88 4159
3. H Gong Y Wang Y Luo 2000 Appl Phys Lett 76 3959
4. AN Banerjee KK Chattopadhyay 2005 J Appl Phys 97 084308
5. CH Ong H Gong 2003 Thin Solid Films 445 299
6. AN Banerjee S Kundoo KK Chattopadhyay 2003 Thin Solid Films 440 5
7. K Tonooka K Shimokawa O Nishimura 2002 Thin Solid Films 411 129
8. C Bouzidi H Bouzouita A Timoumi B Rezig 2005 Mater Sci Eng B 118 259
9. W Lan M Zhang GB Dong PM Dong YY Wang H Yan 2007 Mater Sci Eng B 139 155
10. T Ishiguro N Ishizawa N Mizutani M Kato K Tanaka F Marumo 1983 Acta Crystallogr, B: Struct Sci 39 564 Calculated from ICSD using POWD-12 ++, (1997)
11. Lambert JC, Eysel W (1980) Mineralogical-Petrograph. Institute, Universitat Heidelberg, ICDD Grant-in-Aid, Germany
12. G Tunell E Posnjak CJ Ksanda Z Kristallogr 1935 Kristallgeom Kristallphys Kristallchem 90 120 Calculated from ICSD using POWD-12 ++, (1997)
13. J Pellicer-Porres D Martínez-García A Segura P Rodríguez-Hernández A Muñoz JC Chervin N Garro D Kim 2006 Phys Rev B 74 184301
14. BJ Ingram TO Mason R Asahi KT Park AJ Freeman 2001 Phys Rev B 64 155114
15. X Nie SH Wei SB Zhang 2002 Phys Rev Lett 88 066405
16. V Jayalakshmi R Murugan B Palanivel 2005 J Alloys Compd 388 19
17. J Pellicer-Porres A Segura AS Gilliland A Muñoz P Rodríguez-Hernández D Kim MS Lee TY Kim 2006 Appl Phys Lett 88 181904
18. FA Benko FP Koffyberg 1984 J Phys Chem Solids 45 57
19. H Kawazoe H Yanagi K Ueda H Hosono 2000 Mater Res Bull 8 28
20. JL Cai H Gong 2005 J Appl Phys 98 033707
21. RS Yu SC Liang CJ Lu DC Tasi FS Shieu 2007 Appl Phys Lett 90 191117
22. SB Zhang SH Wei A Zunger 2001 Phys Rev B 63 075205
23. AN Banerjee R Maity PK Ghosh KK Chattopadhyay 2005 Thin Solid Films 474 261
24. H Katayama-Yoshida T Koyanagi H Funashima H Harima A Yanase 2003 Solid State Commun 126 135
25. H Katayama-Yoshida K Sato H Kizaki H Funashima I Hamada T Fukushima VA Dinh M Toyoda 2007 Appl Phys A 89 19