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Volumn 32, Issue 5, 2011, Pages

SPICE compatible analytical electron mobility model for biaxial strained-Si-MOSFETs

Author keywords

columbic; mobility; phonon; SiGe; strained Si; surface roughness

Indexed keywords

ANALYTICAL MODEL; BASIC THEORY; BIAXIAL STRAINS; COLUMBIC; METAL OXIDE SEMICONDUCTOR; MOBILITY MODEL; SIGE; STRAINED-SI; SURFACE ROUGHNESS SCATTERING;

EID: 79958260967     PISSN: 16744926     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-4926/32/5/054001     Document Type: Article
Times cited : (4)

References (7)
  • 1
    • 0031166167 scopus 로고    scopus 로고
    • Moore's law: Past, present and future
    • Schaller R R 1997 Moore's law: past, present and future IEEE Spectrum 53 June
    • (1997) IEEE Spectrum , pp. 53
    • Schaller, R.R.1
  • 2
    • 0031696792 scopus 로고    scopus 로고
    • Cramming more components onto integrated circuits
    • Moore G E 1998 Cramming more components onto integrated circuits Proc IEEE 86 (1) 82
    • (1998) Proc IEEE , vol.86 , Issue.1 , pp. 82
    • Moore, G.E.1
  • 3
    • 0034227743 scopus 로고    scopus 로고
    • Fabrication and analysis of deep submicron strained-Si N-MOSFETs
    • Rim K, Hoyt J L, Gibbons J F 2000 Fabrication and analysis of deep submicron strained-Si N-MOSFETs IEEE Trans Electron Devices 47 (7) 1406
    • (2000) IEEE Trans Electron Devices , vol.47 , Issue.7 , pp. 1406
    • Rim, K.1    Hoyt, J.L.2    Gibbons, J.F.3
  • 7
    • 10644256631 scopus 로고    scopus 로고
    • A physically based analytical model for the threshold voltage of strained-Si n-MOSFETs
    • Nahfeh H, Hoyt J L, Antoniadis D A 2004 A physically based analytical model for the threshold voltage of strained-Si n-MOSFETs IEEE Trans Electron Devices 51 (12) 2069
    • (2004) IEEE Trans Electron Devices , vol.51 , Issue.12 , pp. 2069
    • Nahfeh, H.1    Hoyt, J.L.2    Antoniadis, D.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.