Power dependence of defect formation in SiO2 glass by F 2 laser irradiation

Applied Physics Letters

Volumn 81, Issue 17, 2002, Pages 3164-3166

  Kajihara, Koichi ^a   Ikuta, Yoshiaki ^a   Hirano, Masahiro ^a   Hosono, Hideo ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION PROCESS; ARF LASER PULSE; DEFECT FORMATION; HIGH-POWER; HIGH-PURITY; LASER INDUCED; LASER POWER; ORDERS OF MAGNITUDE; POWER DEPENDENCE; TWO-PHOTON ABSORPTIONS;

DEFECTS; GLASS; IRRADIATION; QUANTUM YIELD; SILICON COMPOUNDS;

TWO PHOTON PROCESSES;

EID: 79958228246     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1514395     Document Type: Article

References (28)

1. I. T. Godmanis, A. N. Trukhin, and K. Hübner, Phys. Status Solidi B 116, 279 (1983). psb PSSBBD 0370-1972
2. D. L. Griscom, J. Ceram. Soc. Jpn. 99, 923 (1991). nsk NSKRE2 0914-5400
3. J. H. Stathis and M. A. Kastner, Phys. Rev. B 29, 7079 (1984). prb PRBMDO 0163-1829
4. K. Arai, H. Imai, H. Hosono, Y. Abe, and H. Imagawa, Appl. Phys. Lett. 53, 1891 (1988). apl APPLAB 0003-6951
5. T. E. Tsai, D. L. Griscom, and E. J. Friebele, Phys. Rev. Lett. 61, 444 (1988). prl PRLTAO 0031-9007
6. T. E. Tsai and D. L. Griscom, Phys. Rev. Lett. 67, 2517 (1991). prl PRLTAO 0031-9007
7. H. Nishikawa, R. Nakamura, Y. Ohki, and Y. Hama, Phys. Rev. B 48, 15584 (1993). prb PRBMDO 0163-1829
8. Y. Ikuta, S. Kikugawa, M. Hirano, and H. Hosono, J. Vac. Sci. Technol. B 18, 2891 (2000). jvb JVTBD9 0734-211X
9. M. Rothschild, D. J. Ehrlich, and D. C. Shaver, Appl. Phys. Lett. 55, 1276 (1989). apl APPLAB 0003-6951
10. D. C. Allan, C. Smith, N. F. Borrelli, and T. P. Seward, III, Opt. Lett. 21, 1960 (1996). opl OPLEDP 0146-9592
11. C. M. Smith, N. F. Borrelli, J. J. Price, and D. C. Allan, Appl. Phys. Lett. 78, 2452 (2001). apl APPLAB 0003-6951
12. H. Hosono, Y. Abe, H. Imagawa, H. Imai, and K. Arai, Phys. Rev. B 44, 12043 (1991). prb PRBMDO 0163-1829
13. K. Kajihara, L. Skuja, M. Hirano, and H. Hosono, Appl. Phys. Lett. 79, 1757 (2001). apl APPLAB 0003-6951
14. K. Kajihara, Y. Ikuta, M. Hirano, T. Ichimura, and H. Hosono, J. Chem. Phys. 115, 9473 (2001). jcp JCPSA6 0021-9606
15. K. Kajihara, L. Skuja, M. Hirano, and H. Hosono, Phys. Rev. Lett. 89, 135507 (2002). prl PRLTAO 0031-9007
16. H. Hosono, Y. Ikuta, T. Kinoshita, K. Kajihara, and M. Hirano, Phys. Rev. Lett. 87, 175501 (2001). prl PRLTAO 0031-9007
17. J. C. Mikkelsen, Jr. and F. L. Galeener, J. Non-Cryst. Solids 37, 71 (1980). jnc JNCSBJ 0022-3093
18. Y. Morimoto, S. Nozawa, and H. Hosono, Phys. Rev. B 59, 4066 (1999). prb PRBMDO 0163-1829
19. L. Skuja, H. Hosono, and M. Hirano, Proc. SPIE 4347, 155 (2001). spi PSISDG 0277-786X
20. H. Hosono, K. Kajihara, T. Suzuki, Y. Ikuta, L. Skuja, and M. Hirano, Solid State Commun. 122, 117 (2002). ssc SSCOA4 0038-1098
21. R. K. Brimacombe, R. S. Taylor, and K. E. Leopold, J. Appl. Phys. 66, 4035 (1989). jap JAPIAU 0021-8979
22. O. Kittelmann and J. Ringling, Opt. Lett. 19, 2053 (1994). opl OPLEDP 0146-9592
23. L. V. Keldysh, Sov. Phys. JETP 20, 1307 (1965). spj SPHJAR 0038-5646
24. H. R. Philipp, in Handbook of Optical Constants of Solids, Academic Press Handbook Series, edited by E. D. Palik (Academic, Florida, 1985), p. 749.
25. T. Tanaka, T. Eshita, K. Tanimura, and N. Itoh, Cryst. Lattice Defects Amorphous Mater. 11, 221 (1985). clm CLDMDJ 0732-8699
26. H. Hosono, M. Mizuguchi, H. Kawazoe, and T. Ogawa, Appl. Phys. Lett. 74, 2755 (1999). apl APPLAB 0003-6951
27. Y. Ikuta, K. Kajihara, M. Hirano, S. Kikugawa, and H. Hosono, Appl. Phys. Lett. 80, 3916 (2002). apl APPLAB 0003-6951
28. M. Oto, S. Kikugawa, N. Sarukura, M. Hirano, and H. Hosono, IEEE Photonics Technol. Lett. 13, 978 (2001). ptl IPTLEL 1041-1135