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Volumn 21, Issue 24, 1996, Pages 1960-1962

193-nm excimer-laser-induced densification of fused silica

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001187910     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.21.001960     Document Type: Article
Times cited : (57)

References (16)
  • 2
    • 36749116856 scopus 로고
    • W. Primak and R. Kampwirth, J. Appl. Phys. 39, 5651 (1968); W. Primak, J. Appl. Phys. 49, 2572 (1977).
    • (1977) J. Appl. Phys. , vol.49 , pp. 2572
    • Primak, W.1
  • 15
    • 0026413746 scopus 로고
    • and references therein
    • G. Williams, J. Non-Cryst. Solids 131-133, 1 (1991), and references therein.
    • (1991) J. Non-Cryst. Solids , vol.131-133 , pp. 1
    • Williams, G.1
  • 16
    • 0001715130 scopus 로고    scopus 로고
    • A stretched exponential function, sometimes referred to Kohlrausch kinetics, has been used to predict a power law dependence for radiation-induced production of defects, observed as E′ centers, in silica. See V. A. Mashkov, W. R. Austin, L. Zhang, and R. G. Leisure, Phys. Rev. Lett. 76, 2926 (1996).
    • (1996) Phys. Rev. Lett. , vol.76 , pp. 2926
    • Mashkov, V.A.1    Austin, W.R.2    Zhang, L.3    Leisure, R.G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.