Fabrication and characterization of nanocrystalline VO2 thin films

Chinese Physics Letters

Volumn 22, Issue 7, 2005, Pages 1746-1748

  Wang, Hong Chen ^a,b   Yi, Xin Jian ^a   Lai, Jian Jun ^a   Li, Yi ^a,b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; FABRICATION; ION BEAMS; NANOCRYSTALS; OPTICAL PROPERTIES; SILICON COMPOUNDS; SINTERING; SPUTTERING; TEMPERATURE; THIN FILMS;

B-Y IONS; FABRICATION AND CHARACTERIZATIONS; ION-BEAM-SPUTTERING; METASTABLES; NANOCRYSTALLINES; OXYGEN ATMOSPHERE; PHASE TRANSITION TEMPERATURES; QUARTZ SUBSTRATE; SILICON SUBSTRATES; VO 2 THIN FILMS;

VANADIUM DIOXIDE;

EID: 22044432856     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/22/7/051     Document Type: Article

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