Characterization of Plasma Enhanced Chemical Vapor Deposition-Physical Vapor Deposition transparent deposits on textiles to trigger various antimicrobial properties to food industry textiles

Thin Solid Films

Volumn 519, Issue 18, 2011, Pages 5838-5845

  Brunon, Céline ^a   Chadeau, Elise ^b   Oulahal, Nadia ^b   Grossiord, Carol ^c   Dubost, Laurent ^d   Bessueille, François ^a   Simon, Farida ^e   Degraeve, Pascal ^b   Leonard, Didier ^a  

^a UNIVERSITÉ LYON 1   (France)

^b University of Lyon   (France)

^c Science et Surface   (France)

^d ZI SUD   (France)

^e TDV Industrie   (France)

Author keywords

Antibacterial activity; Hydrogenated silicon oxycarbide; Physical Vapor Deposition; Plasma Enhanced Chemical Vapor Deposition; Secondary Ion Mass Spectrometry; Silver; Transmission Electron Microscopy; X ray Photoelectron Spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPTH PROFILING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROORGANISMS; ORGANIC POLYMERS; PHOTOELECTRONS; PHOTONS; PHYSICAL VAPOR DEPOSITION; PLASMA CVD; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; SILICON OXIDES; SILVER; TEXTILES; TRANSMISSION ELECTRON MICROSCOPY; TRANSPARENCY;

ANTI-BACTERIAL ACTIVITY; ANTI-MICROBIAL ACTIVITY; ANTI-MICROBIAL PROPERTIES; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; HYDROGENATED SILICON; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TRANSPARENCY PROPERTIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79958139397     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.062     Document Type: Article

References (27)

1. T. Ramachandran, K. Rajendrakumar, and R. Rajendran Text. Eng. 84 2004 42
2. S. Fijan, A. Cencic, and S. Turk Braz. J. Microbiol. 37 2006 356
3. J.M. Goddard, and J.H. Hotchkiss Prog. Polym. Sci. 32 2007 698
4. E.R. Kenawy, S.D. Worley, and R. Broughtons Biomacromolecules 8 2007 1359
5. P. Appendini, and J.H. Hotchkiss Innov. Food Sci. Emerg. Tech. 3 2002 113
6. J. Meichsner, M. Nitschke, R. Rochotzki, and M. Zeuner Surf. Coat. Technol. 74 1995 227
7. R. Shishoo Plasma Technologies for Textiles R. Shishoo, 2007 Woodhead Publishing Cambridge 15
8. J.F. Pierson, D. Wiederkehr, and A. Billard Thin Solid Films 478 2005 196
9. J. Scholz, G. Nocke, F. Hollstein, and A. Weissbach Surf. Coat. Technol. 192 2005 252
10. D.P. Dowling, K. Donnelly, M.L. McConnell, R. Eloy, and M.N. Arnaud Thin Solid Films 398 2001 602
11. E. Chadeau, N. Oulahal, L. Dubost, F. Favergeon, and P. Degraeve Food Control 21 2010 505
12. Y. Xing, X. Yang, and J. Dai J. Sol Gel Sci. Technol. 43 2007 187
13. M.M. Hossain, D. Hegemann, G. Fortunato, A.S. Herrmann, and M. Heuberger Plasma Processes Polym. 4 2007 471
14. B. Despax, and P. Raynaud Plasma Processes Polym. 4 2007 127
15. R. Schmittgens, M. Wolf, and E. Schultheiss Plasma Processes Polym. 6 2009 S912
16. H. Szymanowski, A. Sobczyk, M. Gazicki-Lipman, W. Jakubowski, and L. Klimek Surf. Coat. Technol. 200 2005 1036
17. T. Yuranova, A.G. Rincon, C. Pulgarin, D. Laub, N. Xantopoulos, H.-J. Mathieu, and J. Kiwi J. Photochem. Photobiol. A 181 2006 363
18. R. Mitchell, C.M. Carr, M. Parfitt, J.C. Vickerman, and C. Jones Cellul. 12 2005 629
19. H. Wang, J. Wang, J. Hong, Q. Wei, W. Gao, and Z. Zhu J. Coat. Technol. Res. 4 2007 101
20. Q. Wei, Y. Liu, D. Hou, and F. Huang J. Mater. Process. Tech. 194 2007 89
21. J. McLauchlin, R.T. Mitchell, W.J. Smerdon, and K. Jewell Int. J. Food Microbiol. 92 2004 15
22. Anonymous (2005). Standard ISO 20743.
23. A.I. Maaroof, and G.B. Smith Thin Solid Films 485 2005 198
24. K.R. Catchpole, S. Pillai, and K.L. Lin K. Kurokawa, L.L. Kazmerski, B. McNelis, M. Yamaguchi, C. Wronski, W.C. Sinke, 3rd World Conference on Photovoltaic Solar Energy Conversion, Osaka, Japan, 2003, Proceedings of the Association of Southeast Asian Institutions of Higher Learning 2004 2714
25. G. Schon Acta Chem. Scand. 27 1973 2623
26. S.W. Gaarenstroom, and N. Winograd J. Chem. Phys. 67 1977 3500
27. V. Kumar Kaushik J. Electron. Spectrosc. Relat. Phenom. 56 1991 273