Sub-30 nm defect removal on EUV substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Rastegar, Abbas ^a   Eichenlaub, Sean ^a   Kadaksham, Arun John ^a   House, Matt ^a   Cha, Brian ^a   Yun, Henry ^b  

^a SEMATECH   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

EUVL; Mask blank defects; Sub 30 nm defects cleaning

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; CHEMICAL-MECHANICAL POLISHING PROCESS; CLEANING CYCLES; CLEANING PROCESS; DEFECT REDUCTION; EMBEDDED PARTICLES; EUVL; GLASS POLISHING; HARD PARTICLES; LATEX SPHERES; LOW THERMAL EXPANSION MATERIALS; MASK BLANK DEFECTS; NATURALLY OCCURRING; PARTICLE REMOVAL; PARTICLE REMOVAL EFFICIENCY; SOFT PARTICLES; SUB 30 NM DEFECTS CLEANING;

ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; EXTREME ULTRAVIOLET LITHOGRAPHY; GLASS; OXIDE MINERALS; PARTICLE SIZE; PARTICLES (PARTICULATE MATTER); POLISHING; QUARTZ; REMOVAL; STYRENE; SUBSTRATES; THERMAL EXPANSION;

SURFACE DEFECTS;

EID: 69949121372     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.835197     Document Type: Conference Paper

References (3)

1. A. Rastegar, S. Eichenlaub, A. Kadaksham, V. Kapila, P. Marmillion, "30nm Particle Removal From ExtremeUltraviolet (EUV) Blank Substrates in SEMATECH MBDC," SEMATECH Internal publication- TTID: 07114883A-ENG, (2007).
2. A. Rastegar, E. Eichenlaub, Y. Ikuta, H. Popp, K. Goncher, P. Marmillion, "Mask Blank Cleaning in SEMATECH MBDC 2005 end of year report," SEMATECH Internal publication- TTID: 05124721A-ENG , (2005).
3. W. Cho, P. Kearney, E.M. Gullikson, A. Jia, T. Tamura, A. Tajima, H. Kusunose, C.U. Jeon, "Inspection with Lasertec M7360 at SEMATECH Mask Blank Development Center," Proc. SPIE 6517, 65170D-1(2007).